Titlebook: Dry Etching Technology for Semiconductors; Kazuo Nojiri Book 2015 Springer International Publishing Switzerland 2015 3D Integrated Circuit

只看該作者 · 發(fā)表于 2025-3-25 23:07:15

Kazuo NojiriProvides a comprehensive, systematic guide to dry etching technologies, from basics to latest technologies.Enables beginners to understand the mechanisms of dry etching, without complexities of numeri

只看該作者 · 發(fā)表于 2025-3-26 01:32:01

http://image.papertrans.cn/e/image/283255.jpg

只看該作者 · 發(fā)表于 2025-3-26 07:46:14

只看該作者 · 發(fā)表于 2025-3-26 11:59:31

只看該作者 · 發(fā)表于 2025-3-26 16:36:54

Latest Dry Etching Technologies,ious issue at the 32-nm node and beyond. Furthermore, the discussion includes a review of the double-patterning technology, which is the hot topic of the moment, and three-dimensional integrated circuit (3D IC) etching for the 16-nm node and beyond.

只看該作者 · 發(fā)表于 2025-3-26 17:47:23

Book 2015her miniaturization and integration of semiconductor integrated circuits.?The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers an

		自動登錄	找回密碼
密碼			To register

關于派博傳思			派博傳思旗下網(wǎng)站			友情鏈接
派博傳思介紹	公司地理位置	論文服務流程	影響因子官網(wǎng)	吾愛論文網(wǎng)	大講堂	北京大學	Oxford Uni.	Harvard Uni.
發(fā)展歷史沿革	期刊點評	投稿經(jīng)驗總結	SCIENCEGARD	IMPACTFACTOR	派博系數(shù)	清華大學	Yale Uni.	Stanford Uni.
\|Archiver\|手機版\|小黑屋\| 派博傳思國際 ( 京公網(wǎng)安備110108008328) GMT+8, 2026-1-29 06:26
Copyright © 2001-2015 派博傳思京公網(wǎng)安備110108008328 版權所有 All rights reserved