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11#
發(fā)表于 2025-3-23 11:23:27 | 只看該作者
Quantum-Chemical Investigation of Adsorption and Surface Migration of Atoms and Molecules on Si(111)ses occurring in adsorption layers require knowledge of the adsorption energy, the surface potential relief relative to adparticles, and changes in the geometric and energetic characteristics of molecules on adsorption [.–.].
12#
發(fā)表于 2025-3-23 17:22:22 | 只看該作者
Molecular-Beam Epitaxy of Silicones of MBE were used as a basis for construction of new instruments and for improvement of the characteristics of those already existing. Progress in this area suggests that MBE will enable in the future a new fundamental basis for microelectronics to be found. In particular, three-dimensional integrated circuits will become feasible.
13#
發(fā)表于 2025-3-23 18:40:33 | 只看該作者
Aggregation of Point Defects in Silicon Crystals Growing from the Meltimpurity, oxygen, has a concentration 10.-10. cm. for Si grown without a crucible and 10. cm. for that grown by the Czochralski method [.]. The carbon concentration [.] varies over a wide range and can reach 5.10. cm.. Rapidly diffusing metallic impurities (iron and others) can have concentrations 10. cm. and greater [.].
14#
發(fā)表于 2025-3-24 01:59:47 | 只看該作者
15#
發(fā)表于 2025-3-24 05:31:18 | 只看該作者
Mischa Hansel,Henrike Viehrig,Danae Ankeled semiconducting structures (MSS). A particular case of these are superlattices (SL) consisting of thick layers of one or several mono-layers. Superlattices are actually a new class of materials with a regular band structure. This holds great promise for developments in microelectronics.
16#
發(fā)表于 2025-3-24 09:53:05 | 只看該作者
17#
發(fā)表于 2025-3-24 13:44:44 | 只看該作者
Molecular Epitaxy of A3B5 Compoundsed semiconducting structures (MSS). A particular case of these are superlattices (SL) consisting of thick layers of one or several mono-layers. Superlattices are actually a new class of materials with a regular band structure. This holds great promise for developments in microelectronics.
18#
發(fā)表于 2025-3-24 14:57:26 | 只看該作者
19#
發(fā)表于 2025-3-24 22:45:55 | 只看該作者
beam epitaxy (MBE), which requires an atomically pure surface with the required structure and micromorphology. This is necessary to control the flux density for adatoms and to determine the formation mechanisms of submonolayer coatings and structural reconstructions during preparation of epitaxial films [.–.].
20#
發(fā)表于 2025-3-25 01:22:57 | 只看該作者
https://doi.org/10.1057/9780230116689w thinner and thinner (quantum-well) films, nonequilibrium processes occurring at the liquid-solid interface become an important part of the whole process of epitaxial growth. They determine the initial stages of formation and the structural and electrophysical properties of such a heterostructure.
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