Titlebook: Nanolithography; A Borderland between M. Gentili,C. Giovannella,S. Selci Book 1994 Springer Science+Business Media Dordrecht 1994 AES.PAS.P

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X-Ray Nanolithography: Limits, and Application to Sub-100 NM Manufacturingature sizes from 500 to 30 nm, by virtue of “absorption without scattering” and recently developed mask technology. We show that useful resolution is not limited by diffraction until linewidths are below 50 nm. Mask architecture and patterning methods are presented which are compatible with manufact

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X-ray Phase Shifting Masksnstrated that the inherent resolution of the X-ray can be achieved when the exposure system is designed correctly. This includes, in particular, a careful engineering of the mask design and of the illumination conditions. The large number of orders present in the diffraction from 0.25 . features, wh

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Intense Focused Ion Beams for Nanostructurisation. With adequate ion optical systems target currents of 1 – 10 nA into 100 nm diameter can be obtained from a variety of elemental ions including hydrogen and rare gases. Applications to a number of basic and technical problems in the field of nanostructurisation appear feasible.

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Xiaodan Pan,A. N. Broersd that blind narrators, characters and readers engage with t.Thisbook argues that the most interesting depictions of blindness in Frenchfiction are those which call into question and ultimately undermine theprevailing myths and stereotypes of blindness which dominate Western thought.Rather than seei

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Wolfram Langheinrich,Heinz Benekingd that blind narrators, characters and readers engage with t.Thisbook argues that the most interesting depictions of blindness in Frenchfiction are those which call into question and ultimately undermine theprevailing myths and stereotypes of blindness which dominate Western thought.Rather than seei