Titlebook: Methods and Materials in Microelectronic Technology; Joachim Bargon (Symposium Chairman) Book 1984 Springer Science+Business Media New Yor

緯線

Electron Beam Lithography,Over the past decade, the trend in integrated circuits for computers always has been a doubling of the circuit density every year. To-day’s products have 64.000 memory cells or 700 logic circuits on a 5 × 5 mm. sized chip. For to-morrow, we can expect 288.000 and 516.000 memory cells or 5000 logic circuits on a chip.

極少

指派

Limitations of Digital Electronics,es of this technology were improved several orders of magnitude. This holds especially for the integration density, the power dissipation, the performance, the reliability, and — last not least — the cost per function.

modifier

EXULT

The IBM Research Symposia Serieshttp://image.papertrans.cn/m/image/632215.jpg

Limousine

指令

Recent Advances in the Theory of Impurities and Defects in Semiconductors,ented technologists. In my talk, I shall review a number of recent advances in my field of expertise, with an attempt to place them in a perspective relating to technology in general and microelectronics in particular. Since time is limited, I will not attempt a broad review. Instead, I will focus p

失望昨天

Photolithography and X-ray Lithography,be somewhat higher; it seems possible that this will be in the range of 1 μm..In order to realize a production process to generate sub-μm structures, X-ray lithography is the most promising approach. X-ray lithography at wavelengths between 0.5 and 5 nm is a simple one-to-one shadow-projection proce

失望未來

違抗

Lithographic Materials,iconductor processing concepts. They have survived the change over from wet chemistry etchants to dry plasma etching, and from visible light exposure to UV or electron beam lithography. More specialized resist systems have since been identified but the traditional performers impress by their univers