Titlebook: Methods and Materials in Microelectronic Technology; Joachim Bargon (Symposium Chairman) Book 1984 Springer Science+Business Media New Yor

Holter-monitor

書目名稱Methods and Materials in Microelectronic Technology影響因子(影響力)




書目名稱Methods and Materials in Microelectronic Technology影響因子(影響力)學(xué)科排名




書目名稱Methods and Materials in Microelectronic Technology網(wǎng)絡(luò)公開度




書目名稱Methods and Materials in Microelectronic Technology網(wǎng)絡(luò)公開度學(xué)科排名




書目名稱Methods and Materials in Microelectronic Technology被引頻次




書目名稱Methods and Materials in Microelectronic Technology被引頻次學(xué)科排名




書目名稱Methods and Materials in Microelectronic Technology年度引用




書目名稱Methods and Materials in Microelectronic Technology年度引用學(xué)科排名




書目名稱Methods and Materials in Microelectronic Technology讀者反饋




書目名稱Methods and Materials in Microelectronic Technology讀者反饋學(xué)科排名

faction

High Performance Cooling and Large Scale Integration, a proportionate increase in power per chip. The trade-off between power and speed means that the limited ability of technology to remove heat at high density from compact structures leads to a lower power dissipation per gate at higher levels of integrations and lower speed.

gerrymander

小畫像

Reactive Ion Etching and Related Polymerization Processes, progress that has been made in understanding the role which ion-surface interactions play in increasing the rates of surface etching processes and how this relates to control over etch feature geometry.

帶傷害

承認(rèn)

季雨

invade

反對

RAFF

Silicide Contact and Gate in Microelectronic Devices,A brief review about silicide metallization technology, i.e. the use of transition metal silicides as contacts and gates in large scale integrated silicon devices is presented and a short discussion about the low temperature redistribution of dopant induced by a moving silicidesilicon interface is included.