| 書(shū)目名稱(chēng) | Ion Implantation in Semiconductors and Other Materials | | 編輯 | Billy L. Crowder | | 視頻video | http://file.papertrans.cn/476/475176/475176.mp4 | | 叢書(shū)名稱(chēng) | The IBM Research Symposia Series | | 圖書(shū)封面 |  | | 描述 | During the years since the first conference in this series was held at Thousand Oaks, California, in 1970, ion implantation has been an expanding and exciting research area. The advances in this field were so rapid that a second conference convened at Garmisch- Partenkirchen, Germany, in 1971. At the present time, our under- standing of the ion implantation process in semiconductors such as Si and Ge has reached a stage of maturity and ion implantation techniques are firmly established in semiconductor device technology. The advances in compound semiconductors have not been as rapid. There has also been a shift in emphasis in ion implanta- tion research from semiconductors to other materials such as metals and insulators. It was appropriate to increase the scope of the conference and the IIIrd International Conference on Ion Implanta- tion in Semiconductors and Other Materials was held at Yorktown Heights, New York, December 11 to 14, 1972. A significant number of the papers presented at this conference dealt with ion implanta- tion in metals, insulators, and compound semiconductors. The International Committee responsible for organizing this conference consisted of B. L. Crowder, | | 出版日期 | Book 1973 | | 關(guān)鍵詞 | Plantation; corrosion; crystal; diffusion; electroluminescence; metals; paper; semiconductor | | 版次 | 1 | | doi | https://doi.org/10.1007/978-1-4684-2064-7 | | isbn_softcover | 978-1-4684-2066-1 | | isbn_ebook | 978-1-4684-2064-7 | | copyright | Plenum Press, New York 1973 |
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