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Titlebook: Evolution of Thin Film Morphology; Modeling and Simulat Matthew Pelliccione,Toh-Ming Lu Book 20081st edition Springer-Verlag New York 2008

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書目名稱Evolution of Thin Film Morphology
副標題Modeling and Simulat
編輯Matthew Pelliccione,Toh-Ming Lu
視頻videohttp://file.papertrans.cn/318/317766/317766.mp4
概述Presents basic modeling and simulation tools for quantitative description of thin film morphological evolution.Displays clear conceptual developments in the fundamental understanding of complex surfac
叢書名稱Springer Series in Materials Science
圖書封面Titlebook: Evolution of Thin Film Morphology; Modeling and Simulat Matthew Pelliccione,Toh-Ming Lu Book 20081st edition Springer-Verlag New York 2008
描述Thin?lmdepositionisthemostubiquitousandcriticaloftheprocessesusedto manufacture high-tech devices such as microprocessors, memories, solar cells, microelectromechanicalsystems(MEMS),lasers,solid-statelighting,andp- tovoltaics. The morphology and microstructure of thin ?lms directly controls their optical, magnetic, and electrical properties, which are often signi?cantly di?erent from bulk material properties. Precise control of morphology and microstructure during thin ?lm growth is paramount to producing the - sired ?lm quality for speci?c applications. To date, many thin ?lm deposition techniques have been employed for manufacturing ?lms, including thermal evaporation,sputterdeposition,chemicalvapordeposition,laserablation,and electrochemical deposition. The growth of ?lms using these techniques often occurs under highly n- equilibrium conditions (sometimes referred to as far-from-equilibrium), which leads to a rough surface morphology and a complex temporal evolution. As atoms are deposited on a surface, atoms do not arrive at the surface at the same time uniformly across the surface. This random ?uctuation, or noise, which is inherent to the deposition process, may create surfa
出版日期Book 20081st edition
關鍵詞Helium-Atom-Streuung; REM; aggregation models; coating; continuum equations; modeling; morphology; plasma e
版次1
doihttps://doi.org/10.1007/978-0-387-75109-2
isbn_softcover978-1-4419-2580-0
isbn_ebook978-0-387-75109-2Series ISSN 0933-033X Series E-ISSN 2196-2812
issn_series 0933-033X
copyrightSpringer-Verlag New York 2008
The information of publication is updating

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Mounded Surfaces in nature. These investigations have been motivated by experimental results under certain types of deposition techniques including sputter deposition and chemical vapor deposition, most notably the measurement of growth exponents α, β, and . that are not consistent with the predictions of local gro
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Monte Carlo Simulationsimulus to a system in a somewhat random fashion, with the aim of discerning the general behavior of the system by averaging over the random process. This method is often used when more concrete numerical methods are unavailable or impractical.
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Ballistic Aggregation Modelsto the aggregate if a neighboring lattice point is occupied. This simple modification of a solid-on-solid model can lead to an interesting behavior of the resulting aggregate. We consider only on-lattice ballistic aggregation in this chapter, where the particles can aggregate in the constraints of a
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https://doi.org/10.1007/978-3-8349-6547-9imulus to a system in a somewhat random fashion, with the aim of discerning the general behavior of the system by averaging over the random process. This method is often used when more concrete numerical methods are unavailable or impractical.
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