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Titlebook: Electronic Properties of Semiconductor Interfaces; Winfried M?nch Book 2004 Springer-Verlag Berlin Heidelberg 2004 Interface-induced gap s

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樓主: 萬(wàn)能
21#
發(fā)表于 2025-3-25 04:57:23 | 只看該作者
Laterally Inhomogeneous Schottky Contacts,ality factors . are generally larger than ..,the value determined by the image-force effect only. In other words, the barrier heights depend more strongly on the applied voltage than because of the Schottky effect. Obviously, . metal—semiconductor interfaces are in one way or another not ideal. Ball
22#
發(fā)表于 2025-3-25 07:54:54 | 只看該作者
23#
發(fā)表于 2025-3-25 14:03:37 | 只看該作者
24#
發(fā)表于 2025-3-25 18:22:02 | 只看該作者
25#
發(fā)表于 2025-3-25 23:57:23 | 只看該作者
Extrinsic Interface Dipoles,fficult task. Predeposited atoms were found to form compounds with subsequently evaporated metal atoms, to segregate at the surface of the growing metal film, or to desorb during metal evaporation. Hydrogen preadsorbed on diamond surfaces, on the other hand, happens to be stable against subsequent d
26#
發(fā)表于 2025-3-26 03:05:53 | 只看該作者
Ohmic Contacts,onductors are well within their fundamental band gaps. For sufficiently large barrier heights the current transport is then dominated by thermionic emission over the barrier. However, the . characteristics will become apparently ohmic if the barrier height drops to below approximately 0.3 eV. The .
27#
發(fā)表于 2025-3-26 07:40:08 | 只看該作者
https://doi.org/10.1007/978-3-662-06945-5Interface-induced gap states; Metal-semiconductor contacts; Schottky contacts; Semiconductor heterostru
28#
發(fā)表于 2025-3-26 08:48:32 | 只看該作者
29#
發(fā)表于 2025-3-26 16:10:52 | 只看該作者
30#
發(fā)表于 2025-3-26 19:50:07 | 只看該作者
Voeding bij hemato-oncologische ziekten,fficult task. Predeposited atoms were found to form compounds with subsequently evaporated metal atoms, to segregate at the surface of the growing metal film, or to desorb during metal evaporation. Hydrogen preadsorbed on diamond surfaces, on the other hand, happens to be stable against subsequent deposition of most metals.
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