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Titlebook: Chemical Vapour Deposition; An Integrated Engine Yongdong Xu,Xiu-Tian Yan Book 2010 Springer-Verlag London 2010 Chemical Vapor Deposition (

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樓主: industrious
11#
發(fā)表于 2025-3-23 09:41:51 | 只看該作者
On the Non-Abelian Born-Infeld ActionThis chapter introduces new equipment design and a CVD process methodology. The chapter then gives details of the most commonly used subsystems followed by some special applications of CVD processes.
12#
發(fā)表于 2025-3-23 14:18:08 | 只看該作者
Chemical Vapour Deposition Systems Design,This chapter introduces new equipment design and a CVD process methodology. The chapter then gives details of the most commonly used subsystems followed by some special applications of CVD processes.
13#
發(fā)表于 2025-3-23 18:20:05 | 只看該作者
14#
發(fā)表于 2025-3-24 00:27:23 | 只看該作者
15#
發(fā)表于 2025-3-24 02:36:16 | 只看該作者
Non-BPS States And Branes In String Theory high quality of a CVD coating it is essential to determine the feasibility of a particular CVD reaction first, then select the suitable precursors for the CVD processes. CVD phase diagrams are derived based on the minimisation of Gibbs free energy and are useful in predicting the equilibrium phases
16#
發(fā)表于 2025-3-24 07:47:06 | 只看該作者
17#
發(fā)表于 2025-3-24 14:14:43 | 只看該作者
18#
發(fā)表于 2025-3-24 18:30:18 | 只看該作者
Chemical Vapour Deposition978-1-84882-894-0Series ISSN 1619-0181 Series E-ISSN 2365-0761
19#
發(fā)表于 2025-3-24 21:51:59 | 只看該作者
Andrew Skumanich,Bruce W. Liteso these techniques are introduced to enable a thorough theoretical understanding of the phenomena occurring in a CVD process and the process control parameters. The topics introduced in this chapter include basic gas laws and kinetic theory, vacuum technology, gas transport phenomena and vapour pressures of some commonly used CVD reactant gases.
20#
發(fā)表于 2025-3-25 02:53:06 | 只看該作者
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