Titlebook: Chemical Vapour Deposition; An Integrated Engine Yongdong Xu,Xiu-Tian Yan Book 2010 Springer-Verlag London 2010 Chemical Vapor Deposition (

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書目名稱Chemical Vapour Deposition影響因子(影響力)




書目名稱Chemical Vapour Deposition影響因子(影響力)學(xué)科排名




書目名稱Chemical Vapour Deposition網(wǎng)絡(luò)公開度




書目名稱Chemical Vapour Deposition網(wǎng)絡(luò)公開度學(xué)科排名




書目名稱Chemical Vapour Deposition被引頻次




書目名稱Chemical Vapour Deposition被引頻次學(xué)科排名




書目名稱Chemical Vapour Deposition年度引用




書目名稱Chemical Vapour Deposition年度引用學(xué)科排名




書目名稱Chemical Vapour Deposition讀者反饋




書目名稱Chemical Vapour Deposition讀者反饋學(xué)科排名

BULLY

Physical Fundamentals of Chemical Vapour Deposition,o these techniques are introduced to enable a thorough theoretical understanding of the phenomena occurring in a CVD process and the process control parameters. The topics introduced in this chapter include basic gas laws and kinetic theory, vacuum technology, gas transport phenomena and vapour pres

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Thermodynamics and Kinetics of Chemical Vapour Deposition, high quality of a CVD coating it is essential to determine the feasibility of a particular CVD reaction first, then select the suitable precursors for the CVD processes. CVD phase diagrams are derived based on the minimisation of Gibbs free energy and are useful in predicting the equilibrium phases

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CALL

Microstructure Evolution and Process Control,tant species and reaction paths during a CVD process at high temperature by experimental methods. Meanwhile, various physical and chemical phenomena are involved in the deposition process. For a CVD process, these phenomena include [1]: (1) heat transfer from the heating element to the substrate to

增減字母法

增減字母法

intangibility

Physical Fundamentals of Chemical Vapour Deposition,o these techniques are introduced to enable a thorough theoretical understanding of the phenomena occurring in a CVD process and the process control parameters. The topics introduced in this chapter include basic gas laws and kinetic theory, vacuum technology, gas transport phenomena and vapour pressures of some commonly used CVD reactant gases.

Chauvinistic

Yongdong Xu,Xiu-Tian YanIntroduces the latest research and technological developments, techniques, and driving factors behind chemical vapor deposition (CVD).Includes supplementary material:

Heterodoxy