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Titlebook: Alternative Lithography; Unleashing the Poten Clivia M. Sotomayor Torres Book 2003 Springer Science+Business Media New York 2003 electronic

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發(fā)表于 2025-3-21 17:05:40 | 只看該作者 |倒序?yàn)g覽 |閱讀模式
期刊全稱(chēng)Alternative Lithography
期刊簡(jiǎn)稱(chēng)Unleashing the Poten
影響因子2023Clivia M. Sotomayor Torres
視頻videohttp://file.papertrans.cn/155/154084/154084.mp4
學(xué)科分類(lèi)Nanostructure Science and Technology
圖書(shū)封面Titlebook: Alternative Lithography; Unleashing the Poten Clivia M. Sotomayor Torres Book 2003 Springer Science+Business Media New York 2003 electronic
影響因子Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today ‘s wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today ‘s technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com- mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red- brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more fa
Pindex Book 2003
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3 Diamagnetic susceptibility of AlH4NO8S2,teresting observation is that in most of the works reported so far (except the early works in ref. 2,3 above) the feature sizes have rather been closer to the 100 nm domain than to the 10 nm domain. Furthermore in most of the NIL experiments reported the de-scribed were made with stamps having areas
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https://doi.org/10.1007/978-3-540-44736-8 This mature technique combines high resolution (<10 nm),. dimensional control, alignment capability and high nano-magnetism and turned out to be the technique of choice for nanopatterning. However, despite the progress on electron beam resist sensitivity and low voltage EBL, this technique due to i
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https://doi.org/10.1007/978-3-540-44736-8 known methods of inducing molecules to self-assemble onto a surface from the liquid or vapor phase, they discovered that self-assembly can also occur when a polymeric membrane impregnated with the same kind of molecules is brought into contact with a convenient substrate. The membrane, acting as a
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Alternative Lithography,fe sciences. Alternative techniques to cost-intensive or limited-access fabrication methods with nanometre resolution have been under biologi-cal for nearly two decades. One clear example is the evolving set of scanning probes techniques, which has become ubiquitous in many research areas. If one co
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Viscoelastic Properties of Polymers,cess have been developed, which are reviewed in considerable detail. . Most of them share a common principle: a pattern is transferred into a fluid layer by embossing the mould into it. Usually a thin polymer layer spun on a silicon substrate is moulded by a sequence of steps, which are schematicall
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Wafer Scale Nanoimprint Lithography,teresting observation is that in most of the works reported so far (except the early works in ref. 2,3 above) the feature sizes have rather been closer to the 100 nm domain than to the 10 nm domain. Furthermore in most of the NIL experiments reported the de-scribed were made with stamps having areas
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