Titlebook: Very Large Scale Integration (VLSI); Fundamentals and App David F. Barbe Book 1982Latest edition Springer-Verlag Berlin Heidelberg 1982 Ape

門牙

書目名稱Very Large Scale Integration (VLSI)影響因子(影響力)




書目名稱Very Large Scale Integration (VLSI)影響因子(影響力)學(xué)科排名




書目名稱Very Large Scale Integration (VLSI)網(wǎng)絡(luò)公開度




書目名稱Very Large Scale Integration (VLSI)網(wǎng)絡(luò)公開度學(xué)科排名




書目名稱Very Large Scale Integration (VLSI)被引頻次




書目名稱Very Large Scale Integration (VLSI)被引頻次學(xué)科排名




書目名稱Very Large Scale Integration (VLSI)年度引用




書目名稱Very Large Scale Integration (VLSI)年度引用學(xué)科排名




書目名稱Very Large Scale Integration (VLSI)讀者反饋




書目名稱Very Large Scale Integration (VLSI)讀者反饋學(xué)科排名

Cupidity

VLSI Architecture,s are operated at clock rates approachinq 100 MHz. In spite of this phenomenal growth (or perhaps because of it), there is an expanding list of crucial functions that await the development of circuits with more gates, higher speed, or both.

勉強(qiáng)

Ambiguous

Advanced Lithography,uirements for higher patterning precision, such as better level to level registration and better linewidth control, are often more difficult goals than smaller linewidth, leading to greater refinement and complexity of exposure tools.

Commentary

0172-5734 ectronic box connected to your TV set provides a wonderful array of games. Electronic boxes can translate languages! Electronics has even changed watches from a pair of hands to a set of digits. Integrated circuit (IC) chips, which use transistors to store information in binary form and perform bina

thwart

隱藏

VLSI Device Fundamentals,stems rather than integrated circuits. Although this differentiation may seem trivial, examination of the economics and the capabilities, and the limitations, of VLSI chips results in the conclusion that profound changes in fabrication, design, and product definition must occur before VLSI chips can

Pander

Advanced Lithography,nal semiconductor devices can probably function with dimensions very much smaller than they have at present [1,2] and too small for optical patterning. Development of electron and X-ray lithography has been underway for 14 and 8 years, respectively, both techniques offering increased resolution. Req

overshadow

緩解