Titlebook: Ultimate Limits of Fabrication and Measurement; M. E. Welland,J. K. Gimzewski Book 1995 Springer Science+Business Media Dordrecht 1995 AES

缺陷

顯赫的人

The Use of Actuation Principles for Micro Robotsent applications of micro robots have different requirements, there are no general solutions for choosing the best actuation principle. The evaluation of the advantages and disadvantages of actuation principles mentioned above therefore has to be made according to the class of the robot application.

成績(jī)上升

Blanch

Theory of Conduction through Quantum Necksic areas. We show that quantum finite size effects can be taken into account by a simple semiclassical correction to the Sharvin formula. Recent experiments and calculations on quantum necks formed in atomic-scale point contacts are discussed.

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無(wú)能的人

0168-132X ysics of small structures. ..Ultimate Limits of Fabrication and Measurement. brings together anumber of leading articles from a variety of fields with the commonaim of ultimate miniaturisation and measurement. .978-94-010-4023-5978-94-011-0041-0Series ISSN 0168-132X

泛濫

Electrical Properties of Nanometer-Size Metal-Semiconductor Point Contactshat formed on a flat area. Since the conductance does not depend on the dopant type of semiconductor samples, and thus, cannot be explained with a space charge layer model of surface conductivity, we speculate that the leak conductance is due to a . of semiconductor samples.

CBC471

Basilar-Artery

Nanoscale Fabrication relatively standard electron lithographic methods may be enhanced with modifications to the lithographic process. Lithographic techniques with electrons and X-Rays on very thin layer and monomolecular layer resists show promise for high resolution. Side-wall etching has produced 30 nm dimensions in

Trigger-Point

Self Replicating Systems and Low Cost Manufacturingcular logic elements) by positioning individual atoms and molecules. However, even the ability to make and interconnect a few atomically precise logic elements will have limited impact when we must make and interconnect at least trillions of logic elements to surpass projected future lithographic ca