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Titlebook: RETRACTED BOOK: Plasmonic MEMS; John X. J. Zhang Book 2023Latest edition The Editor(s) (if applicable) and The Author(s), under exclusive

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發(fā)表于 2025-3-21 18:31:35 | 只看該作者 |倒序瀏覽 |閱讀模式
書目名稱RETRACTED BOOK: Plasmonic MEMS
編輯John X. J. Zhang
視頻videohttp://file.papertrans.cn/821/820084/820084.mp4
概述Treats both theoretical and practical aspects of Plasmonic MEMS.Introduces combining Plasmonics with MEMS technology to achieve enhanced system performance.Shows new perspectives and design tools in p
叢書名稱Synthesis Lectures on Materials and Optics
圖書封面Titlebook: RETRACTED BOOK: Plasmonic MEMS;  John X. J. Zhang Book 2023Latest edition The Editor(s) (if applicable) and The Author(s), under exclusive
描述.This book covers key topics in the emerging field of plasmonic MEMS, with an emphasis on practical aspects. Although readers can find many comprehensive textbooks on electromagnetic waves, nanophotonics and plasmonics, most of these lack the focus needed for a thorough grasp of plasmonic micromachining and MEMS..This book introduces the main framework of plasmonic MEMS, providing an overview of introductory concepts, a thorough description of the basic foundations, along with the state-of-the-art and existing challenges. The author presents an abbreviated overview of the basic physics and devices related to electromagnetic waves and surface plasmons. Additional coverage includes recent advances in the fabrication of sub-100-nm patterns on micro scale devices and structures and a review of emerging techniques in the fabrication of plasmonic systems. A comprehensive and historical review of the current advances in the area of plasmonic nanofabrication is also included..This book focuses on an appealing and distinctive aspect of plasmonics, as a tool for patterning and the fabrication of ultra-fine resolution structures. The author reviews the recent developments in plasmonic MEMS an
出版日期Book 2023Latest edition
關(guān)鍵詞Nanophotonics and Plasmonics; MEMS; Optical MEMS; Photonic devices; Nanolithography; Biosensing; Optical M
版次1
doihttps://doi.org/10.1007/978-3-031-23137-7
issn_series 2691-1930
copyrightThe Editor(s) (if applicable) and The Author(s), under exclusive license to Springer Nature Switzerl
The information of publication is updating

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John X. J. Zhangectory deflection and nonadiabatic lag in the motion of the electron. The deviation from a straight-line trajectory is easily taken into account. Nonadiabatic effects have been included by a sequence of methods of increasing sophistication: diabatic states (DS),. classical-trajectory Monte Carlo (CT
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nes the level of induced voltage and the susceptibility of the interference depends upon the level of the path impedance, which, for a given current, determines the level of induced voltage; and the susceptibility of the potential victim circuit. Power mains pollution can also occur if the power lin
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RETRACTED CHAPTER: Plasmonics as a Fabrication Tool,
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2691-1930 ok focuses on an appealing and distinctive aspect of plasmonics, as a tool for patterning and the fabrication of ultra-fine resolution structures. The author reviews the recent developments in plasmonic MEMS an
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