| 書目名稱 | Predictive Simulation of Semiconductor Processing |
| 副標(biāo)題 | Status and Challenge |
| 編輯 | Jarek Dabrowski,Eicke R. Weber |
| 視頻video | http://file.papertrans.cn/755/754608/754608.mp4 |
| 概述 | Detailed and up-to-date explanation of the key processes in semiconductor technology and their computational simulation.Includes supplementary material: |
| 叢書名稱 | Springer Series in Materials Science |
| 圖書封面 |  |
| 描述 | .Predictive Simulation of Semiconductor Processing.?enables researchers and developers?to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool. . |
| 出版日期 | Book 2004 |
| 關(guān)鍵詞 | Deposition processes; Device reliability and process yield; Diffusion; Dopant and impurity diffusion; Mi |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-3-662-09432-7 |
| isbn_softcover | 978-3-642-05804-2 |
| isbn_ebook | 978-3-662-09432-7Series ISSN 0933-033X Series E-ISSN 2196-2812 |
| issn_series | 0933-033X |
| copyright | Springer-Verlag Berlin Heidelberg 2004 |
|Archiver|手機(jī)版|小黑屋|
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