| 書目名稱 | Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |
| 編輯 | Seongbo Shim,Youngsoo Shin |
| 視頻video | http://file.papertrans.cn/747/746843/746843.mp4 |
| 概述 | Introduces a highly promising patterning solution for next generation technology.Provides a comprehensive overview of directed self-assembly lithography (DSAL) friendly physical design and DSAL-aware |
| 叢書名稱 | NanoScience and Technology |
| 圖書封面 |  |
| 描述 | .This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.. |
| 出版日期 | Book 2018 |
| 關(guān)鍵詞 | VLSI CAD for DSA; Physical Design for DSA; DSA-Friendly VLSI Design; DSA; Aware Placement; DSA-Aware Rout |
| 版次 | 1 |
| doi | https://doi.org/10.1007/978-3-319-76294-4 |
| isbn_softcover | 978-3-030-09455-3 |
| isbn_ebook | 978-3-319-76294-4Series ISSN 1434-4904 Series E-ISSN 2197-7127 |
| issn_series | 1434-4904 |
| copyright | Springer International Publishing AG, part of Springer Nature 2018 |
|Archiver|手機(jī)版|小黑屋|
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