Titlebook: New Perspectives on Surface Passivation: Understanding the Si-Al2O3 Interface; Lachlan E. Black Book 2016 Springer International Publishin

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Al,O, Deposition and Characterisation,amined in this work was performed by the APCVD method, except in a few cases where . was deposited by ALD. Therefore we begin in Sect.?. with a detailed description of the APCVD deposition technique and the APCVD system used to deposit the . passivation layers, including a discussion of the various

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Influence of Deposition Parameters,ese states, and hence the passivation properties of the interface, depend sensitively on the conditions under which this interface is formed, and therefore on the parameters of the deposition process in question. As described in Chap.?., for APCVD the main deposition parameters which may be adjusted

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Effect of Post-Deposition Thermal Processing,for Al.O. films deposited at lower temperatures, some thermal treatment is generally required to “activate” the passivation. This step most commonly takes the form of an anneal performed at a temperature of 400–., typically in an . ambient. In Chap.?. it was shown that the APCVD Al.O. films examined

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Lachlan E. Black not our internal state. For Seneca we travel for reasons of which we are unaware, often unwittingly trying to escape our fears and issues or just following what other people do. His consequent recommendation is that instead of traveling we should each develop knowledge which addresses our self-igno