Titlebook: New Directions in Thin Film Nanophotonics; Sreekanth K. V.,Mohamed ElKabbash,Giuseppe Strangi Book 2019 Springer Nature Singapore Pte Ltd.

Semblance

Sub-wavelength Nanopatterning Using Thin Metal Filmschers to improve the resolution of the conventional photolithographic techniques that is restricted by the optical diffraction limit [.]. However, the implementation of recently developed high resolution lithography techniques beyond the diffraction limit are challenging because of their significant

Eviction

Dielectric Singularities in Hyperbolic Metamaterials a vanishing effective permittivity in the direction parallel to their surface plane while an ideally infinite one in the perpendicular direction. Such a unique feature allows the HMM to behave as a perfect near-field lens.

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critique

was an integral part of the 1993-94 IMA program on "Emerging Applications of Probability." We would like to thank Stanislav A. Molchanov and Wojbor A. Woyczynski for their hard work in organizing this meeting and in edit- ing the proceedings. We also take this opportunity to thank the National Scien

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