Titlebook: Nanoimprint Lithography: An Enabling Process for Nanofabrication; Weimin Zhou Book 2013 Springer-Verlag Berlin Heidelberg 2013 Light Emitt

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Principles and Status of Nanoimprint Lithography,e number of transistors per square inch may double approximately every 18 months. However, due to exposure wavelength diffraction limit, the technical complexity and manufacturing costs have been increased dramatically for the nanometer-scale line-width manufacturing. In such a context, next-generat

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Stamp Surface Treatment,tion of imprint resist. The imprint resist is cured by heat or UV light during the imprinting process. Then, the mold is released from the substrate, referred to as demolding. Subsequent processes, such as plasma etching and lift-off, are applied for the pattern transferring [1]. The schematic of th

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Nanoimprint Lithography Process,hing for pattern transfer. The stamp modification has been already demonstrated in .. Before imprinting, the substrate surface is coated by a thin film for imprinting; how to create a uniform imprinted film is a crucial issue. The spin coating is generally a common method to control film thickness.

Substitution

Modeling and Simulation of NIL,nanoimprint lithography process, NIL simulation provides an efficient and accurate use of nanoimprint lithography. By simulation, we can know how to design the stamp, control the process for nanoimprint lithography, and decrease the defect of imprinted patterns.

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Application of NIL in Light-Emitting Diode,be highly efficient and energy saving and have a long lifetime. Compared to some conventional lamps, LED has given birth to the new light technology (solid-state lighting). Among them, GaN-LED is widely considered as one of the most promising next-generation light sources due to its reliability, dur

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