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Titlebook: Microwave Discharges; Fundamentals and App Carlos M. Ferreira,Michel Moisan Book 1993 Springer Science+Business Media New York 1993 Plasma.

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樓主: Holter-monitor
31#
發(fā)表于 2025-3-26 22:33:41 | 只看該作者
32#
發(fā)表于 2025-3-27 03:05:57 | 只看該作者
S. De Benedictissively uncanny. For in the logical circuits of repetition and return, it is hardly coincidental that we have already witnessed the co-incidence, mediated by the mirror image, of Leland Palmer (Ray Wise) and BOB (episode 14). As the host who carried what Dexter Morgan of the Showtime TV series might
33#
發(fā)表于 2025-3-27 09:04:47 | 只看該作者
34#
發(fā)表于 2025-3-27 11:36:47 | 只看該作者
F. M. Diassively uncanny. For in the logical circuits of repetition and return, it is hardly coincidental that we have already witnessed the co-incidence, mediated by the mirror image, of Leland Palmer (Ray Wise) and BOB (episode 14). As the host who carried what Dexter Morgan of the Showtime TV series might
35#
發(fā)表于 2025-3-27 16:47:02 | 只看該作者
36#
發(fā)表于 2025-3-27 18:00:44 | 只看該作者
Theory of Low-Pressure Plasma Columns Produced by Electromagnetic Waves in the Presence of a Constannetic field ... The influence of the magnetic field is twofold: First, in a magnetic field the plasma becomes anisotropic, which reflects in a change of the propagation characteristics and the field structure of the electromagnetic wave. Second, a relatively strong magnetic field must reduce the rad
37#
發(fā)表于 2025-3-28 00:10:31 | 只看該作者
Distributed ECR: Concept, Performances and Perspectivesctures. was progressively ruled out in favor of RF. or microwave plasma sources.. Surface wave. and electron cyclotron resonance (ECR) microwave sustained discharges. were investigated as plasma sources external to the multipolar magnetic structure. But, in such devices, plasma density is limited by
38#
發(fā)表于 2025-3-28 04:22:42 | 只看該作者
Large Area Planar Microwave Plasmasen need to be enhanced. For example process peculiarities in low pressure plasma chemical vapour deposition of diamond thin films result in relative low growth rates. Growth rates of plasma polymerization in these microwave plasmas can exceed the rates achieved in otherwise excited plasmas by one or
39#
發(fā)表于 2025-3-28 09:37:30 | 只看該作者
40#
發(fā)表于 2025-3-28 12:56:07 | 只看該作者
https://doi.org/10.1007/978-1-4899-1130-8Plasma; Semiconductor; electron; ion; waves
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