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Titlebook: Marginalisierung, Stadt und Soziale Arbeit; Soziale Arbeit im Sp Patrick Oehler,Sandra Janett,Bruno Michon Book‘‘‘‘‘‘‘‘ 2023 Der/die Heraus

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31#
發(fā)表于 2025-3-26 21:08:33 | 只看該作者
32#
發(fā)表于 2025-3-27 01:26:29 | 只看該作者
Segregation und soziale Benachteiligungeitrag beleuchtet dies für Frankreich, Deutschland und die Schweiz..Zur Beurteilung der Auswirkungen von segregiertem Wohnen, müssen die jeweiligen Bedingungen in den Blick genommen werden: Handelt es sich um freiwillige oder erzwungene Segregation, ist sie tempor?r und erfüllt eventuell gar eine in
33#
發(fā)表于 2025-3-27 09:05:09 | 只看該作者
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發(fā)表于 2025-3-27 12:50:12 | 只看該作者
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發(fā)表于 2025-3-27 16:06:31 | 只看該作者
acted most attention (for refs see Miller and Weissbach 1977; Bermek 1978; Clark 1980; Parmeggiani and Sander 1980, 1981; Bosch et al. 1983). Because of its remarkable properties and multifunctional activities, EF-Tu can be considered as a model for the investigation of allosteric mechanisms as well
36#
發(fā)表于 2025-3-27 18:40:46 | 只看該作者
Patrick Oehler,Sandra Janettacted most attention (for refs see Miller and Weissbach 1977; Bermek 1978; Clark 1980; Parmeggiani and Sander 1980, 1981; Bosch et al. 1983). Because of its remarkable properties and multifunctional activities, EF-Tu can be considered as a model for the investigation of allosteric mechanisms as well
37#
發(fā)表于 2025-3-28 00:33:56 | 只看該作者
38#
發(fā)表于 2025-3-28 05:01:00 | 只看該作者
Eveline Althausa legitimate area of scientific study. Mechanisms of influence are, indubitably, diverse. Some of this influence is indirect, accounted for simply by the instrumental help that social engagement, associated with good mental health, affords people; for example, psychologically "healthy" people are pr
39#
發(fā)表于 2025-3-28 08:41:05 | 只看該作者
Simone Tappertental importance. The technical goal of laser-assisted chemical vapor deposition of refractory metal films is to rapidly deposit high conductivity films that adhere well to the semiconductor substrate.. In most work to date refractory metal carbonyls were used as precursors for the deposition proces
40#
發(fā)表于 2025-3-28 13:24:56 | 只看該作者
Ute Fischer,Lothar StockFirstly, they are faced with stringent requirements over the deceptively simple parameters of thickness and compositional uniformity of the wafer. The thermal or plasma-generating electric fields needed to give this uniformity are difficult to achieve on scales of several centimetres, and require la
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