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Titlebook: Low-Energy Ion Irradiation of Materials; Fundamentals and App Bernd Rauschenbach Book 2022 The Editor(s) (if applicable) and The Author(s),

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31#
發(fā)表于 2025-3-27 00:47:09 | 只看該作者
32#
發(fā)表于 2025-3-27 05:07:37 | 只看該作者
Ion Beam-Induced Damagest ion or a higher order recoil atom if the transferred energy is higher than the displacement threshold energy. The Kinchin-Pease model, modified Kinchin-Pease model, and the Norgett–Robinson–Torrens model are presented and the calculation of the defect generation rate is demonstrated. Of particular
33#
發(fā)表于 2025-3-27 07:18:26 | 只看該作者
Sputteringsputtering process, especially after low-energy ion bombardment. The theoretical description of the total sputtering yield, and the energy and angular distribution of the sputtered atoms is based on the assumption of a linear cascade regime. The description of the sputtering process in the linear re
34#
發(fā)表于 2025-3-27 12:03:55 | 只看該作者
Evolution of Topography Under Low-Energy Ion Bombardmentn be described by relations of dynamic scaling theory and stochastic growth equations. The surface after ion irradiation with ion energies above the displacement energy is initially characterized by the formation of vacancies, interstitial sites, and adatoms, some of which coalesce into clusters. Th
35#
發(fā)表于 2025-3-27 15:35:03 | 只看該作者
Ion Beam Figuring and Smoothing a predetermined and controlled manner. The IBF method uses the computer-aided codes to realize the desired surface topography, where a spatially and temporally stable ion beam is passed vertically over the surface at a fixed distance in a high-vacuum environment. The main input variables of this ap
36#
發(fā)表于 2025-3-27 20:28:24 | 只看該作者
37#
發(fā)表于 2025-3-28 00:24:20 | 只看該作者
38#
發(fā)表于 2025-3-28 04:42:51 | 只看該作者
Ion Beam-Assisted Depositionthe simultaneous bombardment of the surface with hyperthermal or low-energy ions. The individual sub-processes of the layer deposition, such as the generation of the atoms and ions, the transport of the particles through the vacuum and the processes on the surface during the deposition of the atoms
39#
發(fā)表于 2025-3-28 09:19:57 | 只看該作者
Ion Beam Sputtering Induced Glancing Angle Deposition almost arbitrarily designed nano- and microstructures of all material classes on surfaces. The self-shadowing and the surface diffusion essentially govern the structure evolution. It is demonstrated that by varying the particle incidence angle, the temperature, azimuthal rotation frequency, and the
40#
發(fā)表于 2025-3-28 11:28:33 | 只看該作者
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