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Titlebook: Lipids in Health and Disease; Peter J. Quinn,Xiaoyuan Wang Book 2008 Springer Science+Business Media B.V. 2008 Activation.Lipid.Metabolism

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21#
發(fā)表于 2025-3-25 06:12:08 | 只看該作者
Jing X. Kang,Karsten H. Weylandtdamaged Si layer (160 keV O., 1 x 10./cm., 300 K) by subsequently applying intense ionization from more deeply penetrating but nondamaging electron irradiations (5-20 keV e., 7.5 . 10./cm. 260-280 K). The samples used had been bulk doped with substitutional aluminum (A?.). EPR of the aluminum inters
22#
發(fā)表于 2025-3-25 10:32:49 | 只看該作者
23#
發(fā)表于 2025-3-25 12:09:13 | 只看該作者
Joy L. Little,Steven J. Krideldamaged Si layer (160 keV O., 1 x 10./cm., 300 K) by subsequently applying intense ionization from more deeply penetrating but nondamaging electron irradiations (5-20 keV e., 7.5 . 10./cm. 260-280 K). The samples used had been bulk doped with substitutional aluminum (A?.). EPR of the aluminum inters
24#
發(fā)表于 2025-3-25 16:48:44 | 只看該作者
he framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials s
25#
發(fā)表于 2025-3-25 23:21:10 | 只看該作者
Mikhail Bogdanov,Eugenia Mileykovskaya,William Dowhanhe framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials s
26#
發(fā)表于 2025-3-26 01:48:38 | 只看該作者
Rao Muralikrishna Adibhatla,J. F. Hatcherestinghouse Electric Corporation. The ion beam energy can be varied from 30 KeV to 185 KeV at currents up to 10 ma. The beam optics can vary the spot size at the target from <1 cm. to 100 cm.. The beam can be direct or analyzed. The final lens is after the analyzer and before the post accelerator. T
27#
發(fā)表于 2025-3-26 07:32:27 | 只看該作者
Tetsuji Mutoh,Jerold Chunestinghouse Electric Corporation. The ion beam energy can be varied from 30 KeV to 185 KeV at currents up to 10 ma. The beam optics can vary the spot size at the target from <1 cm. to 100 cm.. The beam can be direct or analyzed. The final lens is after the analyzer and before the post accelerator. T
28#
發(fā)表于 2025-3-26 11:20:09 | 只看該作者
29#
發(fā)表于 2025-3-26 13:04:17 | 只看該作者
30#
發(fā)表于 2025-3-26 19:09:42 | 只看該作者
Gilbert O. Fruhwirth,Albin Hermetter marked after trypsin treatment. White membranes isolated from mutant strains do not stack and exhibit an average size consistent with previous results of electron microscopy. White membrane fragments also do not exhibit stacking . after retinal reconstitution or trypsin treatment. Quasi-elastic lig
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