Titlebook: Lecture Notes on Principles of Plasma Processing; Francis F. Chen,Jane P. Chang Book 2003 Springer Science+Business Media New York 2003 Pl

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ECR Sources,5 GHz. Both the large magnetic field of 875G and the microwave waveguide plumbing make these reactors more complicated and expensive than RIE reactors. Unless one uses tricky methods that depend on nonuniform magnetic fields and densities, microwaves cannot penetrate into a plasma if ω. > ω. Aτ 2.45

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Discharge Equilibrium,roducing the right mixture of chemical species and the energy and flux of ions onto the substrate. For some processes, such as cleaning and stripping, simply a high density of oxygen would do; but for the more delicate etching processes, the proper equilibrium conditions are crucial. Reactor-scale n

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