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Titlebook: Layout Techniques in MOSFETs; Salvador Pinillos Gimenez Book 2016 Springer Nature Switzerland AG 2016

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發(fā)表于 2025-3-21 16:33:07 | 只看該作者 |倒序?yàn)g覽 |閱讀模式
書目名稱Layout Techniques in MOSFETs
編輯Salvador Pinillos Gimenez
視頻videohttp://file.papertrans.cn/583/582143/582143.mp4
叢書名稱Synthesis Lectures on Emerging Engineering Technologies
圖書封面Titlebook: Layout Techniques in MOSFETs;  Salvador Pinillos Gimenez Book 2016 Springer Nature Switzerland AG 2016
描述This book aims at describing in detail the different layout techniques for remarkably boosting the electrical performance and the ionizing radiation tolerance of planar Metal-Oxide-Semiconductor (MOS) Field Effect Transistors (MOSFETs) without adding any costs to the current planar Complementary MOS (CMOS) integrated circuits (ICs) manufacturing processes. These innovative layout styles are based on pn junctions engineering between the drain/source and channel regions or simply MOSFET gate layout change. These interesting layout structures are capable of incorporating new effects in the MOSFET structures, such as the Longitudinal Corner Effect (LCE), the Parallel connection of MOSFETs with Different Channel Lengths Effect (PAMDLE), the Deactivation of the Parallel MOSFETs in the Bird‘s Beak Regions (DEPAMBBRE), and the Drain Leakage Current Reduction Effect (DLECRE), which are still seldom explored by the semiconductor and CMOS ICs industries. Several three-dimensional (3D) numerical simulations and experimental works are referenced in this book to show how these layout techniques can help the designers to reach the analog and digital CMOS ICs specifications with no additional cost
出版日期Book 2016
版次1
doihttps://doi.org/10.1007/978-3-031-02031-5
isbn_softcover978-3-031-00903-7
isbn_ebook978-3-031-02031-5Series ISSN 2381-1412 Series E-ISSN 2381-1439
issn_series 2381-1412
copyrightSpringer Nature Switzerland AG 2016
The information of publication is updating

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沙發(fā)
發(fā)表于 2025-3-21 22:57:04 | 只看該作者
2381-1412 adiation tolerance of planar Metal-Oxide-Semiconductor (MOS) Field Effect Transistors (MOSFETs) without adding any costs to the current planar Complementary MOS (CMOS) integrated circuits (ICs) manufacturing processes. These innovative layout styles are based on pn junctions engineering between the
板凳
發(fā)表于 2025-3-22 03:09:12 | 只看該作者
Book 2016olerance of planar Metal-Oxide-Semiconductor (MOS) Field Effect Transistors (MOSFETs) without adding any costs to the current planar Complementary MOS (CMOS) integrated circuits (ICs) manufacturing processes. These innovative layout styles are based on pn junctions engineering between the drain/sour
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發(fā)表于 2025-3-22 08:08:31 | 只看該作者
Ellipsoidal Layout Style for MOSFET,P, which belongs to the line segment defined by the F. and F. focuses of the ellipsoidal geometry. In addition to this, only two LEF vectorial components are taken into account out of this line segment (Figure 5.1.b).
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978-3-031-00903-7Springer Nature Switzerland AG 2016
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,Fish Layout Style (“<” Gate Shape) for MOSFET,All layout styles (hexagonal, octagonal, and ellipsoidal) described so far in this book were specially proposed to be used in MOSFETs of the analog CMOS ICs because their effective channel lengths (L.) are always higher than the minimum dimension allowed (L.) by the CMOS ICs technology node considered.
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發(fā)表于 2025-3-22 23:21:58 | 只看該作者
,Wave Layout Style (“S” Gate Shape) for MOSFET,The wave layout style was specially proposed in order to overcome the aspect ratio (geometric factor), the total die area limitations, and the asymmetric geometry of the circular annular MOSFET (CA-M). Besides, this style intends to avoid the different electrical behaviors when it operates in the IDBC and EDBC, respectively [28].
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Synthesis Lectures on Emerging Engineering Technologieshttp://image.papertrans.cn/l/image/582143.jpg
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