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Titlebook: Ion Beam Modification of Solids; Ion-Solid Interactio Werner Wesch,Elke Wendler Book 2016 Springer International Publishing Switzerland 201

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樓主: 拿著錫
31#
發(fā)表于 2025-3-26 21:09:27 | 只看該作者
32#
發(fā)表于 2025-3-27 01:59:46 | 只看該作者
Swift Heavy Ion Irradiation of Amorphous Semiconductorson in selected amorphous Group IV and III-V materials are summarized. Complementary molecular dynamics simulations provide additional understanding and in combination with experiment enables new mechanistic insight at the atomic scale.
33#
發(fā)表于 2025-3-27 08:02:22 | 只看該作者
34#
發(fā)表于 2025-3-27 10:28:08 | 只看該作者
35#
發(fā)表于 2025-3-27 16:15:21 | 只看該作者
36#
發(fā)表于 2025-3-27 18:05:23 | 只看該作者
Ion-Solid Interactions, however, also some classical approaches are presented. For amorphous solids, mainly considered here, the binary collisions can be assumed to be statistically independent and the physical quantities (e.g. energy and angular distributions) are obtained by statistics. In the case of crystalline solids, only some special effects are described.
37#
發(fā)表于 2025-3-28 00:19:42 | 只看該作者
38#
發(fā)表于 2025-3-28 05:03:00 | 只看該作者
39#
發(fā)表于 2025-3-28 06:49:57 | 只看該作者
40#
發(fā)表于 2025-3-28 10:26:00 | 只看該作者
Primary Processes of Damage Formation in Semiconductorsd in a third group of materials amorphisation by ion implantation is not observed even not at low temperatures for moderate ion fluences which do not significantly alter the stoichiometry of the material. Various models are applied for describing the damage evolution. This represents a further step
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