Titlebook: Interfacial Compatibility in Microelectronics; Moving Away from the Tomi Laurila,Vesa Vuorinen,Jorma Kivilahti Book 2012 Springer-Verlag Lo

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Tomi Laurila,Vesa Vuorinen,Toni T. Mattila,Markus Turunen,Mervi Paulasto-Kr?ckel,Jorma K. Kivilahtiin a range, which is of great significance in evolutionary genetics. In the case of range regressions which may lead to a diminution or rupture of the range pattern according to the pressure of the endogenous or exogenous triggering factors, subsequently arising distribution obstacles may result in

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Tomi Laurila,Vesa Vuorinen,Toni T. Mattila,Markus Turunen,Mervi Paulasto-Kr?ckel,Jorma K. Kivilahtiypically classified as Lévy walks. However, the movement pattern of the Lévy walk is similar to that of an animal that switches between two behavioural modes in a composite correlated random walk (CCRW) movement process. Recent studies have shown that standard approaches can misidentify the CCRW pro

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Tomi Laurila,Vesa Vuorinen,Toni T. Mattila,Markus Turunen,Mervi Paulasto-Kr?ckel,Jorma K. Kivilahtie, individual-based models of cells are coupled with PDEs for extracellular chemical signals. Travelling waves in these hybrid models are investigated. In particular, we show that in contrary to the PDEs, hybrid chemotaxis models only develop a transient travelling wave.

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Tomi Laurila,Vesa Vuorinen,Toni T. Mattila,Markus Turunen,Mervi Paulasto-Kr?ckel,Jorma K. Kivilahtiind of situations. One interesting result is that the macroscopic drift velocity is given by the mean direction of the underlying linear features, and the diffusion is given by the variance-covariance matrix of the underlying oriented habitat. We illustrate our findings with specific applications to

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gained from an empirical study of a real MNC supply network. The study shows that increasing the level of product variety has a detrimental impact on flow time. In the presence of supply lead-time and demand uncertainty, high levels of variety result in much longer flow times relative to more stabl

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1389-2134 roach to DFR based on deep understanding in materials science, rather than on the use of mechanistic tools, such as FMEA..Interfacial Compatibility in Microelectronics provides a clear and methodical resource f978-1-4471-6068-7978-1-4471-2470-2Series ISSN 1389-2134

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