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Titlebook: Illustrated Anatomical Segmentectomy for Lung Cancer; Hiroaki Nomori,Morihito Okada Book 2012 Springer Japan 2012 Lung Cancer.Segmentectom

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11#
發(fā)表于 2025-3-23 11:17:58 | 只看該作者
Book 2012of the procedure. To better illustrate an accurate anatomical segmentectomy, the text shows details of anatomy during segmentectomy. This can involve up to 25 patterns, each of which is shown in roughly 10 illustrations.
12#
發(fā)表于 2025-3-23 17:25:50 | 只看該作者
ction ofanalogies ofthe discussed reactions and of how they were used in reported industrial processes. This survey is not meant to be absolute or exhaustive but rather to be directive, to be as complete as possible, and to provide food for further thought.
13#
發(fā)表于 2025-3-23 18:10:06 | 只看該作者
book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the978-1-4757-4753-9978-1-4757-4751-5
14#
發(fā)表于 2025-3-23 22:36:20 | 只看該作者
Hiroaki Nomori,Morihito Okadatext intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the
15#
發(fā)表于 2025-3-24 04:26:59 | 只看該作者
Hiroaki Nomori,Morihito Okada in a reaction chamber, (2) heterogeneous reactions occurring on the surface of a substrate and (3) mass transportation of the gaseous precursors. The overall deposition rate of the CVD process is limited by the slowest step in the three aforementioned steps. This chapter covers these topics and giv
16#
發(fā)表于 2025-3-24 08:39:22 | 只看該作者
Hiroaki Nomori,Morihito Okada in a reaction chamber, (2) heterogeneous reactions occurring on the surface of a substrate and (3) mass transportation of the gaseous precursors. The overall deposition rate of the CVD process is limited by the slowest step in the three aforementioned steps. This chapter covers these topics and giv
17#
發(fā)表于 2025-3-24 14:23:03 | 只看該作者
18#
發(fā)表于 2025-3-24 18:13:57 | 只看該作者
19#
發(fā)表于 2025-3-24 19:43:21 | 只看該作者
collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from ma
20#
發(fā)表于 2025-3-25 00:56:46 | 只看該作者
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