| 書目名稱 | High-Resolution X-Ray Scattering |
| 副標題 | From Thin Films to L |
| 編輯 | Ullrich Pietsch,Václav Holy,Tilo Baumbach |
| 視頻video | http://file.papertrans.cn/427/426737/426737.mp4 |
| 概述 | Includes supplementary material: |
| 叢書名稱 | Advanced Texts in Physics |
| 圖書封面 |  |
| 描述 | During the last 20 years interest in high-resolution x-ray diffractometry and reflectivity has grown as a result of the development of the semiconductor industry and the increasing interest in material research of thin layers of magnetic, organic, and other materials. For example, optoelectronics requires a subsequent epitaxy of thin layers of different semiconductor materials. Here, the individuallayer thicknesses are scaled down to a few atomic layers in order to exploit quantum effects. For reasons of electronic and optical confinement, these thin layers are embedded within much thicker cladding layers or stacks of multilayers of slightly different chemical composition. It is evident that the interface quality of those quantum weHs is quite important for the function of devices. Thin metallic layers often show magnetic properties which do not ap- pear for thick layers or in bulk material. The investigation of the mutual interaction of magnetic and non-magnetic layers leads to the discovery of colossal magnetoresistance, for example. This property is strongly related to the thickness and interface roughness of covered layers. |
| 出版日期 | Textbook 2004Latest edition |
| 關鍵詞 | Semiconductor; X-ray scattering; crystal; diffraction; nanostructure; quantum dot; thin film; thin films |
| 版次 | 2 |
| doi | https://doi.org/10.1007/978-1-4757-4050-9 |
| isbn_softcover | 978-1-4419-2307-3 |
| isbn_ebook | 978-1-4757-4050-9Series ISSN 1439-2674 |
| issn_series | 1439-2674 |
| copyright | Springer Science+Business Media New York 2004 |
|Archiver|手機版|小黑屋|
派博傳思國際
( 京公網(wǎng)安備110108008328)
GMT+8, 2025-10-10 06:30
發(fā)表于 2025-3-21 16:26:47
