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Titlebook: High-Power Lasers and Applications; Proceedings of the F Karl Ludwig Kompa,Herbert Walther Conference proceedings 1978 Springer-Verlag Berl

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書目名稱High-Power Lasers and Applications
副標題Proceedings of the F
編輯Karl Ludwig Kompa,Herbert Walther
視頻videohttp://file.papertrans.cn/427/426692/426692.mp4
叢書名稱Springer Series in Optical Sciences
圖書封面Titlebook: High-Power Lasers and Applications; Proceedings of the F Karl Ludwig Kompa,Herbert Walther Conference proceedings 1978 Springer-Verlag Berl
描述The High-Power Lasers and Applications Conference was held in Munich, June 20 - 22, 1977. The conference took place simultaneously with the "Laser 77, International Congress and Trade Fair" at the Munich Fair Ground. The meeting was a continuation of a series of colloquia on elec- tronic transition lasers previously held in the United States. The main topics of the conference were: high-power VUV, UV, visible and IR la- sers, including an analysis of laser systems, technology and laser con- cepts. Also, some applications to nonlinear optics, chemical kinetics and spectroscopy, particularly with respect to isotope separation, were discussed. The conference was attended by 95 scientists representing Austria, Canada, England, Finland, Germany (FRG), Germany (GDR), France, Israel, Italy, The Netherlands, and the U.S.A. The organizers acknowledge financial support from the Deutsche Forschungs- gemeinschaft, the U.S. Air Force Office of Scientific Research, the U.S. Air Force European Office of Aerospace Research and Development (EOARD) and the U.S. Army European Research Office, as well as from the companies Coherent Radiation, Spectra Physics and Cryophysics. Furthermore, we thank our
出版日期Conference proceedings 1978
關(guān)鍵詞ASTER; atom; atoms; chemical laser; electron; kinetics; laser; laser spectroscopy; molecule; nonlinear optics
版次1
doihttps://doi.org/10.1007/978-3-540-35942-5
isbn_softcover978-3-662-15400-7
isbn_ebook978-3-540-35942-5Series ISSN 0342-4111 Series E-ISSN 1556-1534
issn_series 0342-4111
copyrightSpringer-Verlag Berlin Heidelberg 1978
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Electron Beam Controlled, Neon Stabilized XeF Laseronstrained by these limitations and for this reason may be the system of choice in going to high average powers. In this paper we will discuss the operation of the electron beam controlled XeF laser and compare its performance with that of the electron beam pumped laser.
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High Repetition Rate XeF Laser with Gas Recyclinged problems associated with high-repetition-rate operation of a rare gas halide device and have successfully constructed a discharge-excited XeF laser capable of operating at pulse repetition rates extending to 200 Hz.
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Activation and Deactivation Rates in High-Power Lasersltraviolet portions of the spectrum. Table 1 lists a few such systems. In this paper, we shall consider some of the mechanisms for production and relaxation of the energy levels involved in these lasers.
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Simple VUV High Pressure Gas Laser with Coaxial Electron Beam Pumpingstem is expensive and rather complicated. Therefore one may wonder whether in the case of small systems it is possible to obtain a sufficiently fast discharge from a Marx generator only. This is the main point of the present contribution.
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