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Titlebook: Handbook of Thin Film Technology; Hartmut Frey,Hamid R. Khan Book 2015 Springer-Verlag Berlin Heidelberg 2015 Coating characterization.Coa

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41#
發(fā)表于 2025-3-28 16:30:03 | 只看該作者
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發(fā)表于 2025-3-28 21:52:28 | 只看該作者
Hartmut Frey,Thomas Hellmuth he became the principal heir of his uncle Henry Ellis, formerly Governor of Nova Scotia, who on his death in 1806 left him £10,000 and extensive landholdings in Ireland and elsewhere. Francis and his wife Mary, née Kilbee (1777–1847), had six children, of whom Robert, born in 1817, was the youngest
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Cathode Sputtering,puttering process can be used to deposit large areas with very high lateral homogeneity. .- By ion bombardment, the substrates can be cleaned before coating, and the properties of the sputtered film can be influenced, e.g. adhesion, strength, structure, etc.
46#
發(fā)表于 2025-3-29 14:59:59 | 只看該作者
Physical Basics of Modern Methods of Surface and Thin Film Analysis,n diffraction LEED, reflection high energy electron diffraction RHEED) uses the periodic arrangement from surface atoms to the determination of the crystalline structure. The investigation of the electron work function also uses a collective characteristic, the potential jump at the surface.
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發(fā)表于 2025-3-30 07:59:52 | 只看該作者
Particle Beam Sources,e target atom. The energy exchange can be either elastic or inelastic, depending on the constituent particles and the energy of the ions. The momentum of an ion can be sufficient to dislodge a surface atom from a weakly bound position on the sample lattice and cause its relocation on the surface in a more strongly bound position (2).
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