| 書目名稱 | Fundamental Electron Interactions with Plasma Processing Gases | | 編輯 | Loucas G. Christophorou,James K. Olthoff | | 視頻video | http://file.papertrans.cn/350/349989/349989.mp4 | | 叢書名稱 | Physics of Atoms and Molecules | | 圖書封面 |  | | 描述 | This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro- vides an up-to-date and comprehensive account of the fundamental in- teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in- elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the- art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter | | 出版日期 | Book 2004 | | 關(guān)鍵詞 | Cross section; Plasma; cluster; collision; molecule; scattering | | 版次 | 1 | | doi | https://doi.org/10.1007/978-1-4419-8971-0 | | isbn_softcover | 978-1-4613-4741-5 | | isbn_ebook | 978-1-4419-8971-0 | | copyright | Springer Science+Business Media New York 2004 |
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