| 書目名稱 | Film Deposition by Plasma Techniques | | 編輯 | Mitsuharu Konuma | | 視頻video | http://file.papertrans.cn/343/342774/342774.mp4 | | 叢書名稱 | Springer Series on Atomic, Optical, and Plasma Physics | | 圖書封面 |  | | 描述 | Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and- error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under- standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re- quired in order to understand the fundamental deposition processes. A sys- tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are su | | 出版日期 | Textbook 1992 | | 關(guān)鍵詞 | Cross section; Plasma; collision; design; elastic collision; hydrogen; material; mechanisms; molecule; negati | | 版次 | 1 | | doi | https://doi.org/10.1007/978-3-642-84511-6 | | isbn_softcover | 978-3-642-84513-0 | | isbn_ebook | 978-3-642-84511-6Series ISSN 1615-5653 Series E-ISSN 2197-6791 | | issn_series | 1615-5653 | | copyright | Springer-Verlag Berlin Heidelberg 1992 |
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