Titlebook: Emerging Technologies for In Situ Processing; Daniel J. Ehrlich,Van Tran Nguyen (Director) Book 1988 Martinus Nijhoff Publishers, Dordretc

廚房默契

書目名稱Emerging Technologies for In Situ Processing影響因子(影響力)




書目名稱Emerging Technologies for In Situ Processing影響因子(影響力)學(xué)科排名




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書目名稱Emerging Technologies for In Situ Processing被引頻次




書目名稱Emerging Technologies for In Situ Processing被引頻次學(xué)科排名




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書目名稱Emerging Technologies for In Situ Processing年度引用學(xué)科排名




書目名稱Emerging Technologies for In Situ Processing讀者反饋




書目名稱Emerging Technologies for In Situ Processing讀者反饋學(xué)科排名

declamation

CEDE

細(xì)微的差異

New World Order and Small Regions-step patterning of materials by deposition, surface modification, synthesis and etching [1,2]. The lateral dimensions of the processed regions range from several centimeters to less than one micrometer. Contrary to conventional techniques such as chemical vapor deposition (CVD), plasma deposition (

Arthritis

LEVER

LEVER

莎草

Biogeography of New Zealand Lizards,be achieved via deposition employing a tightly focused laser beam, a number of applications for laser deposition have been found in the microelectronics field. For example, highly localized deposition induced by a scanning, focused cw laser beam has been successfully used for direct writing of inter

Fecal-Impaction

appall

New and Developing Sources of Food Proteins circuit manufacturing because they provide a unique combination of high precision, high volume and low cost. In these methods an opaque pattern on a trans-illuminated mask is imaged onto a photoresist—coated wafer. The intensity distribution in the image plane is imprinted on the wafer in two steps