期刊全稱 | PLASMA CHEMISTRY AND PLASMA PROCESSING | 期刊簡稱 | PLASMA CHEM PLASMA P | 影響因子2024 | 2.613 | 視頻video | http://file.papertrans.cn/25/24873/24873.mp4 | ISSN | 0272-4324 | eISSN | 1572-8986 | 出版商 | SPRINGER | 發(fā)行地址 | ONE NEW YORK PLAZA, SUITE 4600 , NEW YORK, United States, NY, 10004 | 學科分類 | 1.Science Citation Index Expanded (SCIE)--Engineering, Chemical | Physics, Applied | Physics, Fluids & Plasmas; 2.Current Contents Electronics & Telecommunications Collection--Chemistry & Physics, Pure & Applied; 3.Current Contents Engineering, Computing & Technology--Chemical Engineering; 4.Current Contents Physical, Chemical & Earth Sciences--Physical Chemistry/Chemical Physics; 5.Essential Science Indicators--Chemistry; | 出版語言 | English |
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