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Titlebook: Computational Electronics; Semiconductor Transp K. Hess,J. P. Leburton,U. Ravaioli Book 1991 Springer Science+Business Media Dordrecht 1991

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樓主: Jefferson
51#
發(fā)表于 2025-3-30 09:17:20 | 只看該作者
WELCHE Steuervorteile gibt es für Sie?semiconductor-metal photodetectors in which parasitic circuit effects are important; and (c) generation of transport parameters for use in drift-diffusion (and hydrodynamic) models while negating assumptions about the nature of the particle velocity distribution function.
52#
發(fā)表于 2025-3-30 13:56:25 | 只看該作者
https://doi.org/10.1007/978-3-658-21885-0 entire coupled model. Furthermore, the mesh and the discretization procedure must be chosen appropriately so that a priori maximum estimates on the solution for the original system hold for the discretized model as well.
53#
發(fā)表于 2025-3-30 20:13:21 | 只看該作者
https://doi.org/10.1007/978-3-663-13012-3n results..For purposes of this workshop, rather that dwell on our accomplishments and successes, we chose rather to summarize our work in the area of Monte Carlo device simulation, and then focus on some failures and work in progress.
54#
發(fā)表于 2025-3-31 00:00:46 | 只看該作者
Drift-Diffusion Systems: Analysis of Discretized Models entire coupled model. Furthermore, the mesh and the discretization procedure must be chosen appropriately so that a priori maximum estimates on the solution for the original system hold for the discretized model as well.
55#
發(fā)表于 2025-3-31 01:24:44 | 只看該作者
56#
發(fā)表于 2025-3-31 05:52:01 | 只看該作者
Book 1991rkshop on Computational Electronics was intended to be a forum for the dis- cussion of the state-of-the-art of device simulation. Three major research areas were covered: conventional simulations, based on the drift-diffusion and the hydrodynamic models; Monte Carlo methods and other techniques for
57#
發(fā)表于 2025-3-31 12:08:17 | 只看該作者
58#
發(fā)表于 2025-3-31 16:30:27 | 只看該作者
Simulation of a Steady-State Electron Shock Wave in a Submicron Semiconductor Device Using High-Ordependent upwind methods. For the ballistic diode (which models the channel of a MOSFET), the shock wave is fully developed in Si (with a 1 volt bias) at 300 K for a 0.1 micron channel and at 77 K for a 1.0 micron channel.
59#
發(fā)表于 2025-3-31 20:14:58 | 只看該作者
60#
發(fā)表于 2025-3-31 22:51:51 | 只看該作者
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