找回密碼
 To register

QQ登錄

只需一步,快速開始

掃一掃,訪問微社區(qū)

打印 上一主題 下一主題

Titlebook: Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies; Yves Pauleau Book 2002 Kluwer Academic Publishers 200

[復(fù)制鏈接]
樓主: Wilder
41#
發(fā)表于 2025-3-28 16:12:50 | 只看該作者
42#
發(fā)表于 2025-3-28 20:09:32 | 只看該作者
Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials,c quality of wafers which are cut from bulk crystals is not good enough for making active devices directly on wafers, to grow same materials as substrates but better quality on wafers (.). Epitaxial growth can be also applied for making stacked multi-layer structures of several layers for such as in
43#
發(fā)表于 2025-3-29 00:46:35 | 只看該作者
Sol-Gel Deposition Processes of Thin Ceramic Films,de range of film compositions can be manufactured by gas phase or liquid phase deposition methods. Due to the high apparative costs of gas phase methods, the use of the sol-gel processing offers advantages by sufficiently inexpensive film technologies. Additionally, purity and stability of the precu
44#
發(fā)表于 2025-3-29 04:40:38 | 只看該作者
Thin Film Deposition By Sol-Gel and CVD Processing of Metal-Organic Precursors,Sol-Gel techniques [.–.]. The success of chemical synthesis routes is largely attributed to the availability of molecular compounds that can be transformed via solution (Sol-Gel) [.–.] or gas phase (CVD) [.,.] reactions into high-purity coatings of desired ceramics or composites. In contrast to the
45#
發(fā)表于 2025-3-29 08:00:06 | 只看該作者
Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes,n wafers in the IC-industry, decorative coatings, anti-reflection and spectrally selective coatings on optical components, and anti-corrosion and anti-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capab
46#
發(fā)表于 2025-3-29 13:33:10 | 只看該作者
47#
發(fā)表于 2025-3-29 19:08:28 | 只看該作者
48#
發(fā)表于 2025-3-29 22:09:32 | 只看該作者
Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures,onic materials and devices for various applications such as wafer marking, substrate surface cleaning, doping and oxidation of silicon, etching and deposition of thin films, exposure or removal of photo-resists, and recrystallization of silicon on insulator substrates [.–.]. The desirability of usin
 關(guān)于派博傳思  派博傳思旗下網(wǎng)站  友情鏈接
派博傳思介紹 公司地理位置 論文服務(wù)流程 影響因子官網(wǎng) 吾愛論文網(wǎng) 大講堂 北京大學(xué) Oxford Uni. Harvard Uni.
發(fā)展歷史沿革 期刊點評 投稿經(jīng)驗總結(jié) SCIENCEGARD IMPACTFACTOR 派博系數(shù) 清華大學(xué) Yale Uni. Stanford Uni.
QQ|Archiver|手機(jī)版|小黑屋| 派博傳思國際 ( 京公網(wǎng)安備110108008328) GMT+8, 2026-1-17 12:20
Copyright © 2001-2015 派博傳思   京公網(wǎng)安備110108008328 版權(quán)所有 All rights reserved
快速回復(fù) 返回頂部 返回列表
东乡县| 洮南市| 上虞市| 延边| 剑川县| 仪征市| 教育| 宜君县| 佛冈县| 阜宁县| 芦山县| 招远市| 商都县| 昭通市| 当涂县| 贺兰县| 巩义市| 普兰县| 涟水县| 宁城县| 南溪县| 吉首市| 特克斯县| 聂拉木县| 平遥县| 舞钢市| 龙胜| 安泽县| 凤山县| 河西区| 驻马店市| 武宁县| 区。| 淳化县| 榆树市| 监利县| 石首市| 铁力市| 芦溪县| 响水县| 曲阳县|