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Titlebook: Amorphous and Crystalline Silicon Carbide IV; Proceedings of the 4 Cary Y. Yang,M. Mahmudur Rahman,Gary L. Harris Conference proceedings 19

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樓主: cerebral-cortex
11#
發(fā)表于 2025-3-23 11:42:32 | 只看該作者
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發(fā)表于 2025-3-23 16:36:10 | 只看該作者
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發(fā)表于 2025-3-24 07:50:13 | 只看該作者
Auswirkungen auf die Konzernsteuerpolitik°C is observed both for Si.H. exposures onto a carbon terminated surface and for C.H. exposures onto a silicon covered surface. Further, about one monolayer of a silicon-covered surface is etched by exposing to oxygen at 1050°C. The resultant etched surface is carbon-covered surface.
17#
發(fā)表于 2025-3-24 13:49:42 | 只看該作者
Problemstellung und Zielsetzungerials and pressure are reported in this paper. A SiC source with unintentional impurities resulted in the creation of a number of striated defects during the initial stage of crystal growth. Three kinds of etch pits (EP-1, EP-2 and EP-3) were observed. The incidence of small-size EP-3 etch pits was
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發(fā)表于 2025-3-24 17:56:33 | 只看該作者
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發(fā)表于 2025-3-25 02:46:56 | 只看該作者
,Die Bausparkassen als Kooperationstr?ger,ting in extreme environments: high temperature, radiation etc. In recent years considerable progress has been achieved in fabrication of semiconductor devices in 3C-SiC. However, the problem of producing good-quality and low-cost substrates of large enough dimensions is still unsolved. CVD- growth o
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