MANAGEMENT(管理)

Total Citations:1292; 2023 JIF:2.692; JIFRank: 203/401 ; Rank-JIF: 203; Number-of-JIF:401; 5 Year JIF:2.565; 5 Year JIF Quartile:Q3; JIF Without Self Cites:1.9; Immediacy Index:0.9; Immediacy Index-dealt:0.971; 2023 JCI:0.46; JCI Rank: 257/402 ; Total Articles:52; JCI Quartile:Q3; JCI Percentile:36.19; Eigenfactor:0.001; Normalized Eigenfactor:0.157; Article Influence Score:0.417; JIF Percentile:49.5; JIF Quartile:Q3; AIS Quartile:Q3; Citable Items:57; % of Articles in Citable items:0.9123; Cited Half-Life:7.3; Citing Half-Life:9.1; % of OA Gold:0.145; Publisher name:ROUTLEDGE JOURNALS, TAYLOR & FRANCIS LTD; Publisher address:2-4 PARK SQUARE,

Total Citations:594; 2023 JIF:1.273; JIFRank: 304/401 ; Rank-JIF: 304; Number-of-JIF:401; 5 Year JIF:1.633; 5 Year JIF Quartile:Q3; JIF Without Self Cites:1.1; Immediacy Index:0.5; Immediacy Index-dealt:0.516; 2023 JCI:0.34; JCI Rank: 296/402 ; Total Articles:44; JCI Quartile:Q3; JCI Percentile:26.49; Eigenfactor:0; Normalized Eigenfactor:0.074; Article Influence Score:0.28; JIF Percentile:24.3; JIF Quartile:Q4; AIS Quartile:Q4; Citable Items:47; % of Articles in Citable items:0.9362; Cited Half-Life:7.8; Citing Half-Life:11.7; % of OA Gold:0.1214; Publisher name:IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC; Publisher address:445 HOES LANE,

Total Citations:715; 2023 JIF:2.976; JIFRank: 185/401 ; Rank-JIF: 185; Number-of-JIF:401; 5 Year JIF:3.945; 5 Year JIF Quartile:Q2; JIF Without Self Cites:2.6; Immediacy Index:3.3; Immediacy Index-dealt:3.323; 2023 JCI:0.67; JCI Rank: 198/402 ; Total Articles:29; JCI Quartile:Q2; JCI Percentile:50.87; Eigenfactor:0.003; Normalized Eigenfactor:0.636; Article Influence Score:3.051; JIF Percentile:54; JIF Quartile:Q2; AIS Quartile:Q1; Citable Items:29; % of Articles in Citable items:1; Cited Half-Life:4.3; Citing Half-Life:11.1; % of OA Gold:0.012; Publisher name:CEVAP-SAO PAULO STATE UNIV-UNESP; Publisher address:CENTER STUDY VENOMS & VENOMOUS,

Total Citations:783; 2023 JIF:3.294; JIFRank: 167/401 ; Rank-JIF: 167; Number-of-JIF:401; 5 Year JIF:3.516; 5 Year JIF Quartile:Q2; JIF Without Self Cites:2.8; Immediacy Index:0.5; Immediacy Index-dealt:0.527; 2023 JCI:0.81; JCI Rank: 164/402 ; Total Articles:30; JCI Quartile:Q2; JCI Percentile:59.33; Eigenfactor:0.001; Normalized Eigenfactor:0.156; Article Influence Score:0.659; JIF Percentile:58.5; JIF Quartile:Q2; AIS Quartile:Q2; Citable Items:32; % of Articles in Citable items:0.9375; Cited Half-Life:5; Citing Half-Life:7.7; % of OA Gold:0.4667; Publisher name:IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC; Publisher address:445 HOES LAN

Total Citations:2003; 2023 JIF:3.355; JIFRank: 163/401 ; Rank-JIF: 163; Number-of-JIF:401; 5 Year JIF:3.307; 5 Year JIF Quartile:Q2; JIF Without Self Cites:3; Immediacy Index:1; Immediacy Index-dealt:1.125; 2023 JCI:0.59; JCI Rank: 222/402 ; Total Articles:28; JCI Quartile:Q3; JCI Percentile:44.9; Eigenfactor:0.001; Normalized Eigenfactor:0.23; Article Influence Score:0.501; JIF Percentile:59.5; JIF Quartile:Q2; AIS Quartile:Q3; Citable Items:29; % of Articles in Citable items:0.9655; Cited Half-Life:7.3; Citing Half-Life:10.9; % of OA Gold:0.5041; Publisher name:WILEY; Publisher address:111 RIVER ST, HOBOKEN, USA, NJ, 07030-5774;