標(biāo)題: Titlebook: Science and Technology of Thin Film Superconductors 2; Robert D. McConnell,Rommel Noufi Book 1990 Springer Science+Business Media New York [打印本頁(yè)] 作者: Halcyon 時(shí)間: 2025-3-21 16:36
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2影響因子(影響力)
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2影響因子(影響力)學(xué)科排名
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2網(wǎng)絡(luò)公開(kāi)度
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2網(wǎng)絡(luò)公開(kāi)度學(xué)科排名
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2被引頻次
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2被引頻次學(xué)科排名
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2年度引用
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2年度引用學(xué)科排名
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2讀者反饋
書(shū)目名稱(chēng)Science and Technology of Thin Film Superconductors 2讀者反饋學(xué)科排名
作者: 破布 時(shí)間: 2025-3-21 21:00 作者: laxative 時(shí)間: 2025-3-22 01:04
P. Arendt,N. Elliott,D. W. Cooke,R. Dye,E. Gray,K. Hubbard,J. Martin,G. Reeves,D. Brown,A. Klapetzkyissenschaften ansieht. Eine an der Idee der Erkl?rung orientierte Wissenschaftstheorie erfordert, die zu erkl?renden Sachverhalte (Explananda) m?glichst genau zu spezifizieren und zu beschreiben. Anschlie?end wird im Rahmen des Erkl?rungshintergrunds nach den zugeh?rigen empirisch gehaltvollen Hypot作者: FLASK 時(shí)間: 2025-3-22 08:28 作者: 錯(cuò) 時(shí)間: 2025-3-22 10:55
L. H. Allen,E. J. Cukauskas,P. K. Damme Stunde ist 100 Stück. Die Daten der Maschine sind: Zugkraft normal 15 t, maximal 22 t, gr??te Hubl?nge 1625 mm, gr??te Schnittgeschwindigkeit 9 m/min, gr??te Rücklaufgeschwindigkeit 36 m/min (beides stufenlos einstellbar), Bohrung in Planscheibe 228 mm, Bohrung im Hauptreduzierring 152 mm.作者: GRAVE 時(shí)間: 2025-3-22 14:17 作者: 疼死我了 時(shí)間: 2025-3-22 19:51
G. Larsson,T. I. Selinder,U. Helmersson,S. Rudnertzgebung auf nationalstaatlicher Ebene für den Besch?ftigtendatenschutz im Allgemeinen sowie für die Umsetzung der neuen Anforderungen bei unternehmensinternen Compliance-Ma?nahmen hat..978-3-658-43756-5978-3-658-43757-2Series ISSN 2512-6997 Series E-ISSN 2512-7004 作者: congenial 時(shí)間: 2025-3-23 00:43 作者: 不能根除 時(shí)間: 2025-3-23 03:04 作者: watertight, 時(shí)間: 2025-3-23 06:14 作者: finale 時(shí)間: 2025-3-23 11:58 作者: 遣返回國(guó) 時(shí)間: 2025-3-23 15:37
Factors Affecting Formation of ‘in Situ’ and 110 K Phase Sputtered Bi-Based Superconducting Thin Fil ensure proper mixing and thus enhance the formation of 110 K phase. The melting point of the Bi-based materials seems to depend on the ambient gas, composition and the degree of prior chemical reaction. Thus the films deposited at substrate temperatures above 450° C melts in oxygen at ~890° C in ox作者: elucidate 時(shí)間: 2025-3-23 19:37
In-Situ Growth of Superconducting Films of Bi-Sr-Ca-Cu-O Using Magnetron Sputterings have a smaller energy barrier to overcome in forming a crystal structure. There is a narrow temperature window for growth of the superconducting phase; at lower temperatures the films tend to be semiconducting, due probably to lack of sufficient thermal energy to crystallize a well-ordered phase. 作者: barium-study 時(shí)間: 2025-3-24 02:16 作者: Allowance 時(shí)間: 2025-3-24 03:04 作者: 樣式 時(shí)間: 2025-3-24 09:09 作者: 空中 時(shí)間: 2025-3-24 13:05 作者: 索賠 時(shí)間: 2025-3-24 15:38
High Tc YBa2Cu3O7?x and TlmCanBa2Cun+1Ox Thin Films by Sputter Deposition from Stoicthiometric Oxideential toward the substrate, causing the preferential resputtering effect observed in the conventional parallel plate sputtering configuration. The compositions of the YBa.Cu.O. and Tl.Ca.Ba.Cu.O. films sputter-deposited using the off centered and the facing target configurations are almost identica作者: Landlocked 時(shí)間: 2025-3-24 21:11 作者: 外科醫(yī)生 時(shí)間: 2025-3-25 02:42 作者: 開(kāi)花期女 時(shí)間: 2025-3-25 04:59 作者: Condescending 時(shí)間: 2025-3-25 11:31
actical applications. The program committee was pleased with the quality of the publications and contributed articles. This conference was highlighted by a fuU day dedicated to presentations from the federallaboratories, discussing a wide range of topics on the fabrication, characterization, and theory of hig978-1-4684-1347-2978-1-4684-1345-8作者: Focus-Words 時(shí)間: 2025-3-25 14:55 作者: 挖掘 時(shí)間: 2025-3-25 18:20
M. R. Tseng,J. J. Chu,Y. T. Huang,W. N. Wang,P. T. Wuder zu f?rdern und das volle Potenzial, das jedem Menschen innewohnt, zu entfalten. Die systematische Nutzung von Diversit?t ?ffnet den Zugang zu ?innerem Wissen’ und bringt mehr Kreativit?t. Die bei der Entwicklung des inneren Teams gewonnenen Erfahrungen k?nnen direkt auf die Führung von Organisationen und 978-3-662-63224-6978-3-662-63225-3作者: 招致 時(shí)間: 2025-3-25 22:45
Shouzheng Wang,Guangcheng Xiongder zu f?rdern und das volle Potenzial, das jedem Menschen innewohnt, zu entfalten. Die systematische Nutzung von Diversit?t ?ffnet den Zugang zu ?innerem Wissen’ und bringt mehr Kreativit?t. Die bei der Entwicklung des inneren Teams gewonnenen Erfahrungen k?nnen direkt auf die Führung von Organisationen und 978-3-662-63224-6978-3-662-63225-3作者: 表示問(wèn) 時(shí)間: 2025-3-26 01:22
H. C. Li,H. R. Yi,R. L. Wang,G. N. Zhou,Y. Chen,B. Yin,X. S. Ron,S. F. Cui,D. S. Dai,L. Liflexiblestructures, and ceremonialism to accommodate a largely mobile and dispersed populace. This expertise in “spatial politics” set the stage early on for the expansionistic success of later Asian empires un978-1-4939-4327-2978-1-4939-1815-7作者: PAEAN 時(shí)間: 2025-3-26 04:45
K. Wasa,H. Adachi,Y. Ichikawa,K. Hirochi,T. Matsushima,A. Enokihara,K. Mizuno,H. Higashino,K. Setsun作者: 暫時(shí)別動(dòng) 時(shí)間: 2025-3-26 10:25
H. Soltner,B. Kabius,C. L. Jia,P. Prieto,U. Poppe,J. Schubert,Ch. Buchal作者: 圍巾 時(shí)間: 2025-3-26 16:11 作者: 失眠癥 時(shí)間: 2025-3-26 17:24
D. K. Aswal,S. C. Karandikar,S. K. Gupta,S. C. Sabharwal,L. C. Gupta,M. K. Gupta作者: agnostic 時(shí)間: 2025-3-26 22:39
Science and Technology of Thin Film Superconductors 2作者: 牲畜欄 時(shí)間: 2025-3-27 04:40
Science and Technology of Thin Film Superconductors 2978-1-4684-1345-8作者: Impugn 時(shí)間: 2025-3-27 06:29 作者: 豎琴 時(shí)間: 2025-3-27 12:23
Superconducting Properties of YBa2Cu3O7/PrBa2Cu3O7 Superlattices find that the broadening of the transition is strongly reduced for d-PrBCO larger than 12? and for samples with d-PrBCO>24? no measurable effect of a 9 Tesla magnetic field parallel to the layers could be detected. We believe that this insensitivity to the magnetic field comes from the absence of flux flow in these modulated structures.作者: 永久 時(shí)間: 2025-3-27 16:02
In-Situ Growth of Y-Ba-Cu-O Films by High Pressure DC Sputteringund 80 K. Tc(zero) and Jc(77 K, zero field) of as-deposited film can be improved from 81 K and 3.1x10. A/cm. to 89 K and 3.1x10.A/cm., respectively by annealing it at 940°C for 3 min in flowing oxygen.作者: palpitate 時(shí)間: 2025-3-27 19:37
Cathodic Sputtering as a Tool for the High-Tc Superconducting Materials Processing evaporation [2], chemical vapor deposition [3], and laser beam deposition [4]. Among these processes the cathodic sputtering is now widely used not only for the deposition of the high-Tc thin films but for the microfabrication of the high-Tc thin film electronic devices.作者: WATER 時(shí)間: 2025-3-28 00:17 作者: 投射 時(shí)間: 2025-3-28 05:35 作者: notion 時(shí)間: 2025-3-28 09:34
Factors Affecting Formation of ‘in Situ’ and 110 K Phase Sputtered Bi-Based Superconducting Thin Fil devices, such as SQUID’s, and power transmission. There are two high T., Bi-based superconductors: viz. 85 K Bi.Sr.CaCu.O. or more generally Bi.(SrCa).Cu.O., (2212) and 110 K Si.Sr.Ca.Cu.O., (2223) phases. Thus the Bi-based superconductors provide the advantage of superconducting critical temperatu作者: 誘惑 時(shí)間: 2025-3-28 11:43
In-Situ Growth of Superconducting Films of Bi-Sr-Ca-Cu-O Using Magnetron Sputterings than post-annealed films has been the goal of many researchers. This has been achieved in YBa.Cu.O. at a number of laboratories, but Bi and Tl-based HTS have proven more difficult. We report superconducting films of Bi.Sr.CaCu.O. and Bi.Sr.Ca.Cu.O. made by magnetron sputtering from a bismuth enric作者: Generosity 時(shí)間: 2025-3-28 18:27
Highly-Textured Tl-Ba-Ca-Cu-O Polycrystalline Superconducting Films on Ag Substrateseal in an over pressure of Ti in order to form the superconducting phases. Annealing protocols were done which result in predominantly the 1212 and 2212 phases. The substrate orientation was varied to determine its effect on film orientation. Material properties of the films were characterized by x-作者: 我不明白 時(shí)間: 2025-3-28 21:39 作者: 夾克怕包裹 時(shí)間: 2025-3-29 02:32 作者: 合群 時(shí)間: 2025-3-29 06:46
Compositional Modifications in Target and Sputtered Y-Ba-Cu-O Films on Annealingctivity. Annealing cycle plays a dominant role. in determining the quality of the high-T. films. Among many factors which control the quality of the film, the optimum temperature of annealing has been shown to depend on the substrate material.. There are conflicting consideration in deciding the opt作者: Flawless 時(shí)間: 2025-3-29 07:43
Control of Thickness and Composition Uniformity in Sputtered Superconducting Thin Filmsonsiderable thickness and composition non-uniformities are commonly encountered in vacuum deposition on stationary substrates. The thickness uniformity in thin films, prepared by evaporation from point or small area sources, is achieved by choosing large distances from the source to the substrates a作者: 情感脆弱 時(shí)間: 2025-3-29 12:12 作者: 刺耳的聲音 時(shí)間: 2025-3-29 16:46 作者: 側(cè)面左右 時(shí)間: 2025-3-29 23:45 作者: cortisol 時(shí)間: 2025-3-30 02:08
Epitaxial Growth of the Gd-Ba-Cu-O Superconducting Thin Films on (100) LaAlO, by Dc-Magnetron Sputingle planar target. The best films had Tco of 92.5K, transition width of 0.57K and critical current density of 3.6x10.A/cm. at 77K with very good reproducibility. The film structure was studied by X-ray spectra in different diffraction geometries. In the Bragg-Brentano (BB) focusing geometry merely作者: oxidize 時(shí)間: 2025-3-30 07:50
In-Situ Growth of Y-Ba-Cu-O Films by High Pressure DC Sputtering–750°C) by the high pressure DC planar diode sputtering process without any further annealing treatment. The sputtering gas was Ar-50%02, and total pressure was 1.5 torr. The target was Y.Ba.Cu.O. compound. The films grown at low substrate temperatures with high discharge current ( ≥ 0.8 A) were con作者: NAG 時(shí)間: 2025-3-30 11:47
Growth of YBaCuO Superconducting Thin Films by Hollow Cathode Magnetron Sputteringeing tried to improve the reproducibility of the composition, texture and superconducting parameters like Tc and Jc. The deposition techniques can be classified into two heads — single source and multi source methods. Among the single source methods, magnetron sputtering and laser ablation technique作者: 樹(shù)木心 時(shí)間: 2025-3-30 16:06
Deposition of YBa2Cu3O7 Films on Sapphire by Rf triode Sputtering of substrates (1). Initially, as-grown films were poor superconductors and required a high-temperature post-growth anneal to attain good superconducting properties. Using this two-step (deposition and subsequent anneal) procedure, high quality superconducting films were obtained on many inert subst作者: 設(shè)想 時(shí)間: 2025-3-30 20:19
The Growth and Characterization of Pb-DOPED Bi-Sr-Ca-Cu-O Thin Filmse amount of Pb doping and post-annealing condition, the formation of 110 K superconducting phase in the film could be ameliorated. X-ray diffraction patterns revealed that the film was dominated by the well-known 2212 and 2223 phases. The proper doping of Pb could not only accelerate the formation o作者: 新義 時(shí)間: 2025-3-30 23:40 作者: Indurate 時(shí)間: 2025-3-31 02:17 作者: antedate 時(shí)間: 2025-3-31 05:07 作者: 無(wú)思維能力 時(shí)間: 2025-3-31 10:14
Book 1990thin film superconductivity. The conference, held April 30-May 4, 1990, in Denver, Colorado, hosted 170 researchers from 17 countries. The response to the conference again emphasized the need for a meeting devoted to the science and technology of thin film superconductors. The breadth of artic1es an作者: 大都市 時(shí)間: 2025-3-31 14:59
Growth Analysis and Properties of Sputter-Deposited YBaCuO Thin Films by X-ray diffraction measurements as a function of different deposition parameters like the substrate material (Al.O., ZrO., MgO, SrTiO., LaAlO., LaGaO.) and the substrate temperature, T.. Good lattice matching and appropriate substrate surface finish were important parameters for epitaxial growth.作者: 欺騙世家 時(shí)間: 2025-3-31 19:19 作者: lacrimal-gland 時(shí)間: 2025-3-31 22:10 作者: happiness 時(shí)間: 2025-4-1 02:25 作者: SEVER 時(shí)間: 2025-4-1 06:31 作者: packet 時(shí)間: 2025-4-1 13:48 作者: ostrish 時(shí)間: 2025-4-1 16:59 作者: 信徒 時(shí)間: 2025-4-1 21:32
J. Talvacchio,M. G. Forrester,J. R. Gavaler,T. T. Bragginsindungswinkel von 7° und zwei achsparallele Durchbrüche von halbmondf?rmigem Querschnitt einzuarbeiten (Abb. 105). Da es sich um einen leicht bearbeitbaren Werkstoff.handelt, kann das gesamte Profil in einem Hub ger?umt werden. Das Bild l??t die verh?ltnism??ig starke Durchmesserzunahme der Nadel ge作者: 蛙鳴聲 時(shí)間: 2025-4-2 02:42 作者: 變白 時(shí)間: 2025-4-2 05:23
J. Geerk,Q. Li,G. Linker,O. Meyer,F. Ratzel,J. Remmel,W. Schauer,R. Smithey,F. Vassenden,X. X. Xisonen, die in Unternehmen oder Organisationen vors?tzlich dolose Handlungen vornehmen. Ihnen f?llt es aufgrund ihres Wissens über Interna leichter, etablierte Schutzma?nahmen zu überwinden. Unternehmensinhaber trifft im Rahmen des mehrdeutigen Begriffs unternehmerischer Compliance auch eine Pflicht,作者: BUMP 時(shí)間: 2025-4-2 10:07
G. Larsson,T. I. Selinder,U. Helmersson,S. Rudnersonen, die in Unternehmen oder Organisationen vors?tzlich dolose Handlungen vornehmen. Ihnen f?llt es aufgrund ihres Wissens über Interna leichter, etablierte Schutzma?nahmen zu überwinden. Unternehmensinhaber trifft im Rahmen des mehrdeutigen Begriffs unternehmerischer Compliance auch eine Pflicht,
