標(biāo)題: Titlebook: Nanoimprint Lithography: An Enabling Process for Nanofabrication; Weimin Zhou Book 2013 Springer-Verlag Berlin Heidelberg 2013 Light Emitt [打印本頁] 作者: 可擴(kuò)大 時間: 2025-3-21 16:23
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication影響因子(影響力)
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication影響因子(影響力)學(xué)科排名
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication網(wǎng)絡(luò)公開度
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication網(wǎng)絡(luò)公開度學(xué)科排名
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication被引頻次
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication被引頻次學(xué)科排名
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication年度引用
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication年度引用學(xué)科排名
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication讀者反饋
書目名稱Nanoimprint Lithography: An Enabling Process for Nanofabrication讀者反饋學(xué)科排名
作者: 文字 時間: 2025-3-21 22:24
Principles and Status of Nanoimprint Lithography,e number of transistors per square inch may double approximately every 18 months. However, due to exposure wavelength diffraction limit, the technical complexity and manufacturing costs have been increased dramatically for the nanometer-scale line-width manufacturing. In such a context, next-generat作者: prolate 時間: 2025-3-22 04:14 作者: 想象 時間: 2025-3-22 06:34
Stamp Surface Treatment,tion of imprint resist. The imprint resist is cured by heat or UV light during the imprinting process. Then, the mold is released from the substrate, referred to as demolding. Subsequent processes, such as plasma etching and lift-off, are applied for the pattern transferring [1]. The schematic of th作者: lymphedema 時間: 2025-3-22 11:34 作者: 倒轉(zhuǎn) 時間: 2025-3-22 16:07
Nanoimprint Lithography Process,hing for pattern transfer. The stamp modification has been already demonstrated in .. Before imprinting, the substrate surface is coated by a thin film for imprinting; how to create a uniform imprinted film is a crucial issue. The spin coating is generally a common method to control film thickness. 作者: Substitution 時間: 2025-3-22 17:57
Modeling and Simulation of NIL,nanoimprint lithography process, NIL simulation provides an efficient and accurate use of nanoimprint lithography. By simulation, we can know how to design the stamp, control the process for nanoimprint lithography, and decrease the defect of imprinted patterns.作者: Affirm 時間: 2025-3-23 00:49
Application of NIL in Light-Emitting Diode,be highly efficient and energy saving and have a long lifetime. Compared to some conventional lamps, LED has given birth to the new light technology (solid-state lighting). Among them, GaN-LED is widely considered as one of the most promising next-generation light sources due to its reliability, dur作者: START 時間: 2025-3-23 04:08 作者: ALTER 時間: 2025-3-23 07:26 作者: 迷住 時間: 2025-3-23 12:34
.Points out distinctions between China, Asian neighbors, and.This comprehensive reference views China’s welfare system through a cultural-historical lens to integrate its complex story into the global study of welfare. Focusing on the mainland’s vast, mainly rural population and its long and complic作者: COMMA 時間: 2025-3-23 14:41
Weimin Zhouwelfare. Focusing on the mainland’s vast, mainly rural population and its long and complicated history, it analyzes rural welfare from the imperial dynasties, to the socialist planned economy under Mao Zedong, to its recent history in the current market economy. Findings from government and academic作者: 神秘 時間: 2025-3-23 21:19
Weimin Zhou.Points out distinctions between China, Asian neighbors, and.This comprehensive reference views China’s welfare system through a cultural-historical lens to integrate its complex story into the global study of welfare. Focusing on the mainland’s vast, mainly rural population and its long and complic作者: 神秘 時間: 2025-3-24 00:25 作者: cylinder 時間: 2025-3-24 02:34
Weimin Zhoubsistence, rather than to pursue profits. The structure and the characteristics of subsistence production of Korean farming have not been transformed into a fully capitalist production system. The scale of individual farming is too small to benefit from modern agro-technology to ensure for capital a作者: Eclampsia 時間: 2025-3-24 07:28 作者: 紀(jì)念 時間: 2025-3-24 12:47 作者: idiopathic 時間: 2025-3-24 18:08 作者: 嬉耍 時間: 2025-3-24 20:15
Weimin Zhouthe various domains in which these women manifest their power (.) even when they face daunting challenges from inhibiting traditions, exploitation by males (and in some cases by other women) in their society, and the actions of corrupt officials of governments legally and constitutionally dedicated 作者: Complement 時間: 2025-3-25 02:18 作者: 無孔 時間: 2025-3-25 06:07 作者: geriatrician 時間: 2025-3-25 10:57 作者: HACK 時間: 2025-3-25 13:23 作者: Oligarchy 時間: 2025-3-25 19:46 作者: MURKY 時間: 2025-3-25 20:02 作者: 容易做 時間: 2025-3-26 00:34 作者: nutrients 時間: 2025-3-26 07:27
Stamp Surface Treatment,referred to as demolding. Subsequent processes, such as plasma etching and lift-off, are applied for the pattern transferring [1]. The schematic of the nanoimprint lithography processes is given in Fig. 4.1.作者: 數(shù)量 時間: 2025-3-26 12:15
Application of NIL in Solar Cell, the real applications of solar energy. “New Sunshine Project” started in 1993, and the incentive program “Residential PV System Dissemination Program” began in 1994 [2]. China has also taken effective measures to promote the development of solar cell.作者: needle 時間: 2025-3-26 16:29
ofabrication and nanotechnology.Includes approximately 200 fNanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emergi作者: convulsion 時間: 2025-3-26 17:12 作者: flimsy 時間: 2025-3-27 00:43 作者: Anthrp 時間: 2025-3-27 02:31 作者: 輕快走過 時間: 2025-3-27 08:43
Nanoimprint Lithography Resists,ed portion becomes insoluble to the photoresist developer, and an exposed portion of the photoresists is soluble to the photoresist developer [1]. Figure 5.1 shows the basic microlithography process of photoresists.作者: modish 時間: 2025-3-27 11:02
Nanoimprint Lithography Process,ontrolling of pattern defect, alignment, and full area imprinted pattern are among the hot topics. Recently, a great deal of attention has been paid to soft UV nanoimprint because of the full area conformal contact with the substrate.作者: 表示向前 時間: 2025-3-27 15:53
, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. .Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.978-3-662-51086-5978-3-642-34428-2作者: GRATE 時間: 2025-3-27 20:55 作者: Genetics 時間: 2025-3-28 01:53
Nanoimprint Lithography: An Enabling Process for Nanofabrication978-3-642-34428-2作者: 不吉祥的女人 時間: 2025-3-28 03:54 作者: 重畫只能放棄 時間: 2025-3-28 08:35 作者: Gourmet 時間: 2025-3-28 12:07 作者: Adrenaline 時間: 2025-3-28 15:10 作者: eustachian-tube 時間: 2025-3-28 22:27
Weimin Zhouence production is a non-capitalist production system. The industrialisation process altered the patterns of farming production and consumption of farm households into a more market-centred economy. The commodity market became one of the most eminent mechanisms through which agriculture is exploited作者: incubus 時間: 2025-3-28 23:30 作者: ALTER 時間: 2025-3-29 04:46
Weimin Zhouof women in public and private spaces. Rural South Asian women have been engaged in complex negotiations about their status, have enhanced their self-esteem, and have increased their capacity to effect more changes than previously, when they looked up to men to bring about such changes.作者: 華而不實 時間: 2025-3-29 07:21 作者: 大吃大喝 時間: 2025-3-29 12:45 作者: 大炮 時間: 2025-3-29 17:49 作者: 喊叫 時間: 2025-3-29 20:54
https://doi.org/10.1007/978-3-642-34428-2Light Emitting Diodes; Memory Devices; Nanoimprint Lithography; Solar Cell
