標題: Titlebook: Nanolithography; A Borderland between M. Gentili,C. Giovannella,S. Selci Book 1994 Springer Science+Business Media Dordrecht 1994 AES.PAS.P [打印本頁] 作者: advocate 時間: 2025-3-21 17:04
書目名稱Nanolithography影響因子(影響力)
書目名稱Nanolithography影響因子(影響力)學科排名
書目名稱Nanolithography網(wǎng)絡公開度
書目名稱Nanolithography網(wǎng)絡公開度學科排名
書目名稱Nanolithography被引頻次
書目名稱Nanolithography被引頻次學科排名
書目名稱Nanolithography年度引用
書目名稱Nanolithography年度引用學科排名
書目名稱Nanolithography讀者反饋
書目名稱Nanolithography讀者反饋學科排名
作者: Matrimony 時間: 2025-3-21 22:25 作者: 吞噬 時間: 2025-3-22 00:44
Nanolithography Developed Through Electron-Beam-Induced Surface Reactioncrylate (PMMA) resist patterns and 14 nm diameter carbon dot patterns have been demonstrated by 50 kV scanning electron microscope (SEM)-EBISED. A tungsten rod pattern with 15 nm diameter and carbon dot patterns with 10 nm diameters have been fabricated by scanning transmission microscope (STEM)-EBI作者: violate 時間: 2025-3-22 05:05 作者: LURE 時間: 2025-3-22 09:24
Sub-10nm Electron Beam Lithography: -AIF3-Doped Lithium Fluoride as a Resisted a variety of quantum effects such as Aharonov-Bohm oscillations [1], universal conductance fluctuations [2], persistent currents [3], single-electron effects [4], etc. In any case, these phenomena are only detectable at sufficiently low temperatures in the Kelvin range or below. Especially for me作者: 揮舞 時間: 2025-3-22 13:39 作者: 吹氣 時間: 2025-3-22 17:36
Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wehe wires down to 16 nm have been achieved. The wires show strong photoluminescence emission even for geometrical widths less than 20 nm and without overgrowth. The weak decrease of the quantum efficiency with decreasing wire width indicates that there is no significant damage at the sidewalls of the作者: cravat 時間: 2025-3-22 22:37
Fabrication, investigation and manipulation of artificial nanostructures the improvement of the fabrication technology for the future use of these low-dimensional structures in optoelectronic devices has emerged growing interest over the past few years. The use of high resolution electron beam lithography is a very variable, direct technological approach for the fabrica作者: CUR 時間: 2025-3-23 05:12
Nano-Lithography in 3 Dimensions with Electron Beam Induced Depositiona very fine electron beam in a dedicated field emission scanning electron microscope renders nanometer size deposits which extend from surfaces to heights in the micrometer range. Having an image processor attached to the microscope gives the capability to control the two- and three-dimensional depo作者: 艦旗 時間: 2025-3-23 06:16
Nanolithography Requirements — An Equipment Manufacturers Viewg technique. The many diverse system component technologies which combine to provide EBL as we know it, have been well researched and developed for the more industrially based microlithography field. Fortunately most of these important component techniques can be scaled downwards, at least over the 作者: cardiac-arrest 時間: 2025-3-23 13:03
X-Ray Nanolithography: Limits, and Application to Sub-100 NM Manufacturingature sizes from 500 to 30 nm, by virtue of “absorption without scattering” and recently developed mask technology. We show that useful resolution is not limited by diffraction until linewidths are below 50 nm. Mask architecture and patterning methods are presented which are compatible with manufact作者: coddle 時間: 2025-3-23 15:41
X-ray Phase Shifting Masksnstrated that the inherent resolution of the X-ray can be achieved when the exposure system is designed correctly. This includes, in particular, a careful engineering of the mask design and of the illumination conditions. The large number of orders present in the diffraction from 0.25 . features, wh作者: SAGE 時間: 2025-3-23 22:01 作者: 止痛藥 時間: 2025-3-24 01:31
Intense Focused Ion Beams for Nanostructurisation. With adequate ion optical systems target currents of 1 – 10 nA into 100 nm diameter can be obtained from a variety of elemental ions including hydrogen and rare gases. Applications to a number of basic and technical problems in the field of nanostructurisation appear feasible.作者: 游行 時間: 2025-3-24 04:28 作者: EXALT 時間: 2025-3-24 08:16 作者: IRS 時間: 2025-3-24 13:10 作者: 陰險 時間: 2025-3-24 16:22 作者: organism 時間: 2025-3-24 22:15
Xiaodan Pan,A. N. Broersd that blind narrators, characters and readers engage with t.Thisbook argues that the most interesting depictions of blindness in Frenchfiction are those which call into question and ultimately undermine theprevailing myths and stereotypes of blindness which dominate Western thought.Rather than seei作者: Bronchial-Tubes 時間: 2025-3-25 01:34
Wolfram Langheinrich,Heinz Benekingd that blind narrators, characters and readers engage with t.Thisbook argues that the most interesting depictions of blindness in Frenchfiction are those which call into question and ultimately undermine theprevailing myths and stereotypes of blindness which dominate Western thought.Rather than seei作者: Baffle 時間: 2025-3-25 03:47 作者: cardiovascular 時間: 2025-3-25 10:09 作者: Conducive 時間: 2025-3-25 14:19
H. W. P. Koops,M. Rudolph,J. Kretz,M. WeberIn poetry, for example, there have been, or are in the process of coming into being, the Cornell Wordsworth, McGann’s Oxford Byron, Stillinger’s Keats, and Robinson and Powell’s Oxford Clares; and the letters and journals of Wordsworth, Coleridge, Byron, and Keats have been more or less thoroughly e作者: 媒介 時間: 2025-3-25 16:40 作者: 棲息地 時間: 2025-3-25 20:54
S. Kalbitzer,Ch. Wilbertz,Th. Millere recently opened up new opportunities for genetic experiments in human cell lines. However, the possibility to easily modify the genome still remains a powerful tool to investigate the function of coding and regulatory sequences in the vertebrate genome. DT40 has never been a quick and easy road to作者: Priapism 時間: 2025-3-26 02:23
W. Fallmann,A. Bruckner,E. Cekan,W. Friza,F. Paschke,G. Stangl,F. Thalinger,H. L?schner,G. Stengl,P.e recently opened up new opportunities for genetic experiments in human cell lines. However, the possibility to easily modify the genome still remains a powerful tool to investigate the function of coding and regulatory sequences in the vertebrate genome. DT40 has never been a quick and easy road to作者: 戰(zhàn)勝 時間: 2025-3-26 05:39
A. L. de Lozanne,W. F. Smith,E. E. Ehrichse recently opened up new opportunities for genetic experiments in human cell lines. However, the possibility to easily modify the genome still remains a powerful tool to investigate the function of coding and regulatory sequences in the vertebrate genome. DT40 has never been a quick and easy road to作者: Override 時間: 2025-3-26 11:34 作者: evanescent 時間: 2025-3-26 15:39
J. A. Dagatar, the possibility to easily modify the genome still remains a powerful tool to investigate the function of coding and regulatory sequences in the vertebrate genome. DT40 has never been a quick and easy road to fame. It would be unfair to blame this on DT40 as it has proven to be a reliable and robu作者: MILL 時間: 2025-3-26 20:20
X-Ray Nanolithography: Limits, and Application to Sub-100 NM Manufacturinge-locked electron-beam lithography will solve this problem. Projection x-ray lithography with zone plates should be effective to the limits of the lithographic process. Applications of sub-100 nm XRL, including MOS, quantum-effect, and optoelectronic devices are discussed.作者: 昏睡中 時間: 2025-3-26 22:35
Direct Writing with a Combined STM/SEM Systemde it possible to measure the electrical properties of narrow nickel wires, which is the first four-point measurement of a structure made by STM. The work of other groups in this field will also be reviewed briefly.作者: 閑聊 時間: 2025-3-27 03:07 作者: Robust 時間: 2025-3-27 06:19
Electron Beam Resists and Pattern Transfer Methodse directly via a personal computer (PC). For this reason the paper will focus on electron beam microfabrication, although many processes are common to other forms of radiation such as UV light. X-rays or ion beams.作者: 怪物 時間: 2025-3-27 10:57
Direct Writing of Nanoscale Patterns in SiO2ctly write nanoscale patterns in it should enhance the fabrication techniques for ultra-small devices. In this paper, we review the results to date, and compare the SiO. process with other nanolithography techniques.作者: Frisky 時間: 2025-3-27 15:20 作者: palliative-care 時間: 2025-3-27 20:50 作者: reaching 時間: 2025-3-27 23:18
Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and We wires, which is in contrast to previous studies on dry-etched structures. The photoluminescence energy of the In.Ga.As/InP wires is independent of the wire dimension down to widths of 50 nm. For wires with smaller widths an increasing blue shift of photoluminescence energy up to 60 meV is observed displaying strong lateral quantization effects.作者: 開花期女 時間: 2025-3-28 02:48 作者: Constant 時間: 2025-3-28 06:40
Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope based lithography, ultra thin resist films are essential. The deposition of such films using self-assembling organosilanes is described. Where the organic group is benzyl methyl chloride, the resist layer can be patterned with electrons down to 4 eV in energy. The viability of a proximal probe based lithographic technology is discussed.作者: 說不出 時間: 2025-3-28 11:28
Book 1994lithography. ..Nanolithography. contains updated reviews by major experts on thewell established techniques -- electron beam lithography (EBL), X-raylithography (XRL), ion beam lithography (IBL) -- as well as onemergent techniques, such as scanning tunnelling lithography (STL)..作者: Contend 時間: 2025-3-28 16:12
0168-132X one beinglithography. ..Nanolithography. contains updated reviews by major experts on thewell established techniques -- electron beam lithography (EBL), X-raylithography (XRL), ion beam lithography (IBL) -- as well as onemergent techniques, such as scanning tunnelling lithography (STL)..978-90-481-4388-7978-94-015-8261-2Series ISSN 0168-132X 作者: Arresting 時間: 2025-3-28 21:25
Sub-10nm Electron Beam Lithography: -AIF3-Doped Lithium Fluoride as a Resiston effects [4], etc. In any case, these phenomena are only detectable at sufficiently low temperatures in the Kelvin range or below. Especially for metallic systems, we could turn to higher temperatures — and this is a key issue for possible applications — if the minimum lateral dimensions of these devices can be shrinked down to ? 10m.作者: LASH 時間: 2025-3-29 03:00
Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barion energy of a quantum well covered with GaAs as a barrier and a vacuum barrier potential wen. Dot structures of widths down to 25 nm in size have been generated. We observe high luminescence intensites even from small structures as well as a blueshift of up to 9 meV for 25 nm quantum dots.作者: 蓋他為秘密 時間: 2025-3-29 05:22 作者: 吹牛需要藝術 時間: 2025-3-29 09:26 作者: 領袖氣質 時間: 2025-3-29 13:15
Latest Results Obtained with the Alpha Ion Projection Machinethout moving mechanical parts with nanometer precision. Due to the negligible scattering of ions in comparison to electrons there is no need for proximity corrections..Recent results obtained with the advanced research type “Alpha Ion Projector” are:作者: foodstuff 時間: 2025-3-29 18:51
0168-132X uantum phenomena in confined boxes, wires, rings, etc. Anew class of electronic devices based on this physics has beenproposed, with the promise of a new functionality for ultrafast and/orultradense electronic circuits. Such applications demand highlysophisticated fabrication techniques, the crucial作者: adipose-tissue 時間: 2025-3-29 22:35 作者: Urologist 時間: 2025-3-30 03:24
Fabrication of X-ray mask for nanolithography by EBLnte Carlo simulation (MC) allowed the study of the scattering processes (and thus the energy deposition mechanism) occurring in the resist. In particular, the contributes from the forward and from the backscattering, could be separately computed. Dense and reproducible 65 nm gold line-width resoluti作者: lipids 時間: 2025-3-30 07:53
Xiaodan Pan,A. N. Broersertounexpected, ways. This book challenges everything we thought we knew aboutblindness and invites us to revel in the pleasures and perils of readingblind.. .?.978-1-137-43511-8Series ISSN 2947-7409 Series E-ISSN 2947-7417 作者: GNAW 時間: 2025-3-30 09:39
Wolfram Langheinrich,Heinz Benekingertounexpected, ways. This book challenges everything we thought we knew aboutblindness and invites us to revel in the pleasures and perils of readingblind.. .?.978-1-137-43511-8Series ISSN 2947-7409 Series E-ISSN 2947-7417 作者: dilute 時間: 2025-3-30 14:22
P. Ils,M. Michel,A. Forchel,I. Gyuro,P. Speier,E. Zielinskiretical texts that address various aspects of design processes. Given its scope, the book will appeal to undergraduate and graduate students, and to researchers and practitioners in design, urban planning, urban design, architecture, art, etc..978-3-030-61915-2978-3-030-61916-9Series ISSN 2199-580X Series E-ISSN 2199-5818 作者: meritorious 時間: 2025-3-30 18:40 作者: 細菌等 時間: 2025-3-30 23:01 作者: Bone-Scan 時間: 2025-3-31 01:20 作者: seroma 時間: 2025-3-31 05:50
A. L. de Lozanne,W. F. Smith,E. E. Ehrichsprovides an up to date overview of the different facets of research, and also intends to help newcomers get started and avoid looming pitfalls. The collection of protocols which have been kindly provided by a number of laboratories will be 978-94-017-8264-7978-1-4020-4896-8Series ISSN 0306-0225 Series E-ISSN 2542-8810 作者: 頭腦冷靜 時間: 2025-3-31 10:06
C. R. K. Marrian,F. K. Perkins,S. L. Brandow,T. S. Koloski,E. A. Dobisz,J. M. Calvertprovides an up to date overview of the different facets of research, and also intends to help newcomers get started and avoid looming pitfalls. The collection of protocols which have been kindly provided by a number of laboratories will be 978-94-017-8264-7978-1-4020-4896-8Series ISSN 0306-0225 Series E-ISSN 2542-8810 作者: 和平 時間: 2025-3-31 14:07
Shinji Matsui,Yukinori Ochiai,Masakazu Baba,Heiji Watanabe作者: 極少 時間: 2025-3-31 17:46
H. W. P. Koops,M. Rudolph,J. Kretz,M. Weberedition to date: sufficient to note that discussions began in 1982, serious textual investigation got under way in 1984, and the major textual policy decisions were made at the beginning of 1987. The first batch of novels (a chronologically representative selection) will appear in 1992. Two or three作者: Engaging 時間: 2025-3-31 22:36 作者: Arrhythmia 時間: 2025-4-1 03:36
J. A. Dagatathe DT40 handbook has been conceived and written. This book provides an up to date overview of the different facets of research, and also intends to help newcomers get started and avoid looming pitfalls. The collection of protocols which have been kindly provided by a number of laboratories will be 作者: Paradox 時間: 2025-4-1 06:26 作者: 不合 時間: 2025-4-1 11:37 作者: Exploit 時間: 2025-4-1 14:29 作者: output 時間: 2025-4-1 21:35 作者: Inscrutable 時間: 2025-4-2 02:28
Nanolithography978-94-015-8261-2Series ISSN 0168-132X
