標(biāo)題: Titlebook: Gaseous Dielectrics IX; Loucas G. Christophorou,James K. Olthoff Book 2001 Springer Science+Business Media New York 2001 Plasma.dielectric [打印本頁] 作者: Jejunum 時(shí)間: 2025-3-21 19:38
書目名稱Gaseous Dielectrics IX影響因子(影響力)
作者: Self-Help-Group 時(shí)間: 2025-3-21 22:29 作者: 異端邪說2 時(shí)間: 2025-3-22 04:04
Ion Motion in Dielectric Gasesastic and inelastic momentum transfer and reaction cross sections, coefficients of mobility, diffusion and reaction rates, to name only the most relevant quantities. There exist many cases in the literature where a researcher faces the problem of having only meagre, or even lacking, ion swarm or cro作者: neuron 時(shí)間: 2025-3-22 06:22
Electron Transport, Ionization, and Attachment Coefficients in C2F4 and C2F4 /AR Mixturesn drift velocity and the effective ionization coefficient as functions of the density-reduced electric field ./. are reported for mixtures of C.F. with Ar, which may be useful in efforts to obtain electron collision cross sections for C.F. using Boltzmann codes. The effect of Penning ionization on t作者: 縮減了 時(shí)間: 2025-3-22 12:06 作者: Insul島 時(shí)間: 2025-3-22 14:12
Deposition of Plasma Polymer Films by an Atmospheric Pressure Glow Dischargen.. The dielectric barrier discharge is usually a filamentary one and therefore strongly inhomogeneous. A homogeneous DBD without filaments was described by Okazaki et al. in a planar electrode configuration in He, later also in other gases and gas mixtures.. According to some similarities with the 作者: Insul島 時(shí)間: 2025-3-22 19:49
https://doi.org/10.1007/978-3-658-08104-1sonance state (lifetime τ = ?/., .= resonance width), has profound effects especially on collision channels which involve a reaction of the nuclear framework, i.e. on vibrational excitation (VE) and on dissociative attachment (DA). Apart from well-known shape resonances such as H..(.∑.), N..(.∏.), C作者: disparage 時(shí)間: 2025-3-22 22:50
https://doi.org/10.1007/978-3-476-05321-3dant components which, in the case of laboratory plasmas, are usually electrons and neutral gas molecules. The plasmas used in materials processing are often so called . or . plasmas.. Although they contain a variety of high energy species (neutrals, radicals and ions in excited states) the plasma d作者: paltry 時(shí)間: 2025-3-23 04:07
https://doi.org/10.1007/978-3-476-05742-6astic and inelastic momentum transfer and reaction cross sections, coefficients of mobility, diffusion and reaction rates, to name only the most relevant quantities. There exist many cases in the literature where a researcher faces the problem of having only meagre, or even lacking, ion swarm or cro作者: 過多 時(shí)間: 2025-3-23 09:21 作者: 常到 時(shí)間: 2025-3-23 10:49 作者: Extemporize 時(shí)間: 2025-3-23 16:59
https://doi.org/10.1007/978-3-642-56432-1n.. The dielectric barrier discharge is usually a filamentary one and therefore strongly inhomogeneous. A homogeneous DBD without filaments was described by Okazaki et al. in a planar electrode configuration in He, later also in other gases and gas mixtures.. According to some similarities with the 作者: 嗎啡 時(shí)間: 2025-3-23 21:30 作者: Aids209 時(shí)間: 2025-3-23 23:43 作者: installment 時(shí)間: 2025-3-24 02:39 作者: 事與愿違 時(shí)間: 2025-3-24 08:57
Electron Interactions with c-C4F8, see Refs..-.). Perfluorocyclobutane is also of environmental interest because it is a global warming gas.. For these reasons, we have recently synthesized and assessed electron collision cross-section and electron transport-coefficient data for this gas.. The results of this critical assessment are summarized and briefly discussed in this paper.作者: 遠(yuǎn)地點(diǎn) 時(shí)間: 2025-3-24 10:54 作者: ambivalence 時(shí)間: 2025-3-24 18:02 作者: 演講 時(shí)間: 2025-3-24 20:52 作者: 千篇一律 時(shí)間: 2025-3-25 00:21
Excess Electron Mobility in Argon Gas in an Extended Temperature and Density RangeThe study of the transport properties of excess electrons in dense non polar gases is aimed at understanding the nature of the electron states in a disordered medium and at elucidating how the electron-atom interaction is modified by the interplay between the quantum nature of the electron and the short average interatomic distance in a dense gas.作者: 盲信者 時(shí)間: 2025-3-25 06:57
Book 2001.Gaseous Dielectrics IX .covers recent advances and developments in a wide range of basic, applied, and industrial areas of gaseous dielectrics.作者: brother 時(shí)間: 2025-3-25 10:12 作者: fiscal 時(shí)間: 2025-3-25 14:31 作者: GEST 時(shí)間: 2025-3-25 18:53
https://doi.org/10.1007/978-3-476-05321-3as molecules receive energy and which maintains the plasma. These primary interactions generate molecules in various excited states, in ionized forms (cations and anions) and finally as fragmentation products, also in excited and ionized forms.. All these particles mutually interact, incuding photon作者: Medley 時(shí)間: 2025-3-25 20:32 作者: HOWL 時(shí)間: 2025-3-26 04:06 作者: 前面 時(shí)間: 2025-3-26 08:13 作者: 費(fèi)解 時(shí)間: 2025-3-26 11:55 作者: Distribution 時(shí)間: 2025-3-26 12:43 作者: novelty 時(shí)間: 2025-3-26 17:54 作者: Ergots 時(shí)間: 2025-3-26 22:46
Aristotle’s Theory of Practical Cognitionstudied to investigate the potentiality of rare gases as sensitive media in radiation detectors. and high energy electronic transition lasers.. In fact, rare gases have the ability to convert efficiently electron kinetic energy to electronic excitations and to convey the excitation energy to lower-l作者: 怒目而視 時(shí)間: 2025-3-27 03:29 作者: Restenosis 時(shí)間: 2025-3-27 08:48
Gary Cornell,Joseph H. Silverman development of plasma processing tools where both ion energy and radical fluxes can be controlled to obtain reasonable etch rates with minimal surface damage. Recent work indicates that reactive ion etching (RIE) process optimization can be achieved primarily through a consideration of plasma elect作者: 嚴(yán)厲譴責(zé) 時(shí)間: 2025-3-27 11:57
The Selberg sieve for sequences,ity in integrated circuits is pushing all microelectronics manufacturing processes including plasma etching to their limits. Transition towards new materials (e.g. Cu, low-k dielectrics), control of plasma damage mechanisms (e.g. charging) and new environmentally friendly etching chemistries (e.g. C作者: 強(qiáng)壯 時(shí)間: 2025-3-27 17:19 作者: Stress 時(shí)間: 2025-3-27 19:20
Berechnung von speziellen Funktionen,silicon to form volatile SiX. (X = halogen) species. Unfortunately, the most widely-used feed gas, CF., has a high global warming potential.. As a consequence, other halocarbons are being considered as replacements for CF.. Trifluoroiodomethane, CF.I, is a promising candidate: It has a low global-wa作者: Flat-Feet 時(shí)間: 2025-3-27 23:39 作者: 天文臺(tái) 時(shí)間: 2025-3-28 06:07
Dynamics of Low Energy Electron Collisions with Molecules and Clustersring phases for the relevant partial waves and the influence of temporary negative ion states (resonances).. For quite a few atoms and molecules, special behaviour of the s - wave (. = 0) phase shift leads to a deep Ramsauer-Townsend minimum in the scattering cross section between 0 and 1 eV which s作者: VEST 時(shí)間: 2025-3-28 08:35 作者: 惰性女人 時(shí)間: 2025-3-28 10:37
Ion Motion in Dielectric Gasesportant as their use is their abatement (.), since gases like SF. or some perfluorocarbons are potent greenhouse gases. The above processes require that at some stage the gas be subjected to discharge conditions, which are nowadays optimized by previous modeling and process simulation, which in turn作者: 整潔 時(shí)間: 2025-3-28 17:47
Electron Mobility and Effective Ionization Coefficients in SF6-CO2 Mixturesuld retain many of the outstanding properties of this gas as a high voltage insulator and, at the same time being more environmentally friendly. Thus, intensive research has been carried out on SF. mixed with other gases. such as SF.-Ar, SF.-N., SF.-He, SF.-CH., SF.-CHF., and SF.-CO.. In particular,作者: homeostasis 時(shí)間: 2025-3-28 20:11
Electron Transport, Ionization, and Attachment Coefficients in C2F4 and C2F4 /AR Mixturesct of electron and photon impact on c-C.F., and also as a product of thermal decomposition of c-C.F.. Consequently, dissociative processes can make C.F. a significant gas constituent. Therefore, in order to model c-C.F. plasmas, it is important to know the electron transport, ionization, and attachm作者: 形容詞 時(shí)間: 2025-3-29 00:24
Rate Constants for Unimolecular Decomposition of SF6tachment [.-.] and the stability of SF. with respect to decomposition in subsequent collisions with SF. [.]. It is also recognized as a potent greenhouse gas and it has been suggested that a mixture of SF. and N. might serve as a substitute for pure SF. in certain applications which require gaseous 作者: Parley 時(shí)間: 2025-3-29 06:44
Electron Interactions with c-C4F8, see Refs..-.). Perfluorocyclobutane is also of environmental interest because it is a global warming gas.. For these reasons, we have recently synthesized and assessed electron collision cross-section and electron transport-coefficient data for this gas.. The results of this critical assessment ar作者: abreast 時(shí)間: 2025-3-29 07:40 作者: 壟斷 時(shí)間: 2025-3-29 12:11
Ir Fluorescence of XE2 Molecules in Beam-Excited Xe Gas and AR-XE Gas Mixture at High Pressuresstudied to investigate the potentiality of rare gases as sensitive media in radiation detectors. and high energy electronic transition lasers.. In fact, rare gases have the ability to convert efficiently electron kinetic energy to electronic excitations and to convey the excitation energy to lower-l作者: reflection 時(shí)間: 2025-3-29 15:34
Calculation of the Global Warming Potential for Sulfur Hexafluoride Using the Updated Atmospheric Liic lifetime for this compound. Concentrations of SF. and other trace atmospheric gases were measured at altitudes ranging from 3 to 30 kilometers (well into the stratosphere). Mesospheric air (representing air from altitudes above 50 km) was sampled from air masses moving through the polar vortices.作者: GIST 時(shí)間: 2025-3-29 23:45
The use of SF6 as a Plasma Processing Gas development of plasma processing tools where both ion energy and radical fluxes can be controlled to obtain reasonable etch rates with minimal surface damage. Recent work indicates that reactive ion etching (RIE) process optimization can be achieved primarily through a consideration of plasma elect作者: Hearten 時(shí)間: 2025-3-30 00:49 作者: overture 時(shí)間: 2025-3-30 05:23
Deposition of Plasma Polymer Films by an Atmospheric Pressure Glow Dischargeaining organic compounds for thin film deposition by plasma polymerization is well known.. These films are successfully applied for corrosion protection and as diffusion barriers2. Operating non thermal discharges under atmospheric pressure conditions requires no vacuum devices, therefore the integr作者: strdulate 時(shí)間: 2025-3-30 08:38 作者: 斷斷續(xù)續(xù) 時(shí)間: 2025-3-30 13:40
Electron Collision Processes in Nitrogen Trifluorideurce in pulsed electrical-chemical lasers. The electron collision database is of interest for modeling and simulation of plasma enhanced etching of materials. We have recently made comprehensive measurements of the absolute dissociative ionization cross-sections of nitrogen trifluoride and also of i作者: Anterior 時(shí)間: 2025-3-30 18:10
,Aristotle’s Criticism of Time, localized microwave discharges.. The key processes in these techniques are electron attachment reactions. So, for modeling the system it is necessary to know the rate of these processes, their mechanism and products.作者: ALE 時(shí)間: 2025-3-30 23:06
https://doi.org/10.1007/978-94-011-7527-2 Preliminary comparison of the SF. concentration profile to that for CO. indicates that the previous calculation of its atmospheric lifetime (i.e., the time to reach 1/e of its original concentration) at 3200 years is overestimated by a factor of approximately 5, assuming the dominant atmospheric sink for SF. is in the mesosphere.作者: surmount 時(shí)間: 2025-3-31 02:07
Thermal Electron Capture by some Halocarbons localized microwave discharges.. The key processes in these techniques are electron attachment reactions. So, for modeling the system it is necessary to know the rate of these processes, their mechanism and products.作者: calorie 時(shí)間: 2025-3-31 05:36 作者: Anguish 時(shí)間: 2025-3-31 10:12
Hannah Arendt — Entdeckung der Pluralit?t intensive research has been carried out on SF. mixed with other gases. such as SF.-Ar, SF.-N., SF.-He, SF.-CH., SF.-CHF., and SF.-CO.. In particular, the latter mixture has a higher minimum impulse breakdown voltage than pure SF., and therefore it could be a good substitute for some insulation applications.作者: 事與愿違 時(shí)間: 2025-3-31 16:55
Aristotle’s Theory of Practical Cognitiont, rare gases have the ability to convert efficiently electron kinetic energy to electronic excitations and to convey the excitation energy to lower-lying atomic and excimer levels which emit a considerable fraction of the released energy in a narrow band vacuum ultraviolet (VUV) range..作者: 主動(dòng) 時(shí)間: 2025-3-31 17:39
