標題: Titlebook: Erosion and Growth of Solids Stimulated by Atom and Ion Beams; G. Kiriakidis,G. Carter,J. L. Whitton Book 1986 Martinus Nijhoff Publishers [打印本頁] 作者: Forbidding 時間: 2025-3-21 18:32
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書目名稱Erosion and Growth of Solids Stimulated by Atom and Ion Beams讀者反饋學科排名
作者: 浪蕩子 時間: 2025-3-21 21:20 作者: Wallow 時間: 2025-3-22 01:33
The Theory of the Preferential Sputtering of Alloys, Including the Role of Gibbsian Segregation,ed situation in which the outermost atom layer shows a composition spike of one component while a depleted region begins at atom layer .. This situation is manifested in experimental profiles, in conflicting results between experiments done (for example) with Ion Scattering and Auger Electron Spectr作者: 憤世嫉俗者 時間: 2025-3-22 04:50 作者: 制度 時間: 2025-3-22 11:02
On the Composition of the Sputtered Flux from Metal Targets and their Compounds,ms. This is no longer true for oxides as well as for targets with adsorbed oxygen on the surface. In addition, excited and ionized particles as well as molecules are sputtered under such conditions and their contribution to the sputtered flux can increase by orders of magnitude (1,2). This effect is作者: COLON 時間: 2025-3-22 13:27
Geometric Methods of Analysis,ither accretion or erosion, but which have been utilised specifically in connection with the topographical modification of crystalline and amorphous solids subjected to energetic atom bombardment. Both the methods, and where appropriate, the mathematical theory are treated in chronological order, ev作者: COLON 時間: 2025-3-22 20:35
Surface Topographical Evolution: Computational Methods of Analysis, some geometrical examples of developing surfaces have been described by Nobes.. For many practical applications however, where the characteristics are not straight lines, only computational models allow detailed quantitative calculations to be made. In three dimensions even when the characteristics作者: 外面 時間: 2025-3-23 01:14 作者: 俗艷 時間: 2025-3-23 05:00
Experimental Studies of Morphology Development,f the approximately eight years of experimental investigation of ion beam-induced modification of metal surfaces made by myself and my many collaborators. A list of these collaborators and the many institutes involved is given in the Acknowledgements section. However, I would like to preface this co作者: POLYP 時間: 2025-3-23 07:49
Investigation of Microtopography Induced during Sputter Depth Profiling of Ni/Cr Multilayered Strucental composition near surfaces. The electron and mass spectrometry in conjunction with ion sputter erosion allow one to probe the in-depth elemental composition near surfaces as well as the interfaces within the solids. In such a way the so called sputter depth profiles are obtained (1,2).作者: TAIN 時間: 2025-3-23 18:02
Bubbles, Blisters, and Exfoliation, (see e.g. Carter et al. /1 /, G. Carter and J. Whitton, this conference). A second mechanism is due to the implantation of unsoluble gas ions, especially He, but also Ne, Ar, Kr, Xe, H, and N into the subsurface layers of a solid. It is the phenomena observed during gas ion implantation that this p作者: 表示問 時間: 2025-3-23 22:51 作者: curriculum 時間: 2025-3-24 02:44 作者: Radiculopathy 時間: 2025-3-24 08:02
Reactive Ion Etching of GaAs and Related III-V Compounds,le of ion bombardment and chemical reaction in dry etching of these compound semiconductors. Both high pressure (≥0.1 Torr) and low pressure (1–100 mTorr) experiments are outlined using the dark space DC bias voltage to characterize the etch. Surface analysis of etched GaAs and InP using AES, photol作者: CHURL 時間: 2025-3-24 11:31
Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface Modification, whose characteristics are interesting for the improvement of surface properties (wear-, corrosion-, thermal oxidation resistance) (1). One of the limiting factors for such treatments is the shallow thickness of the modified layer.作者: hazard 時間: 2025-3-24 17:45 作者: 草率女 時間: 2025-3-24 20:25 作者: Annotate 時間: 2025-3-25 00:22 作者: Obituary 時間: 2025-3-25 04:07
NATO Science Series E:http://image.papertrans.cn/e/image/314901.jpg作者: 慢跑 時間: 2025-3-25 10:56 作者: capillaries 時間: 2025-3-25 12:25 作者: HAUNT 時間: 2025-3-25 19:40 作者: 物質 時間: 2025-3-25 20:55
Causation and Acute Viral Diseases,ons. However, for a successful application of ion implantation it is necessary to understand well the physical and chemical mechanisms involved. At present, the low-energy mechanisms of the atomic collisions phenomena in solids is perhaps the least understood domain of ion implantation. This is part作者: Blanch 時間: 2025-3-26 00:46 作者: 抱狗不敢前 時間: 2025-3-26 04:50
The Metaphysics of Illness Causation,al case of this formalism. Expressions are deduced to show how both continuous surfaces and surface discontinuities evolve during growth and erosion and it is demonstrated how these can be used to advise geometrical and numerical methods of surface evolution prediction.作者: seduce 時間: 2025-3-26 12:29 作者: Anthrp 時間: 2025-3-26 15:55 作者: 角斗士 時間: 2025-3-26 18:52 作者: neutral-posture 時間: 2025-3-26 22:25 作者: 堅毅 時間: 2025-3-27 04:12 作者: 詼諧 時間: 2025-3-27 05:31 作者: DAMN 時間: 2025-3-27 11:14
Propositions and Philosophical Ideas related to ridges, ledges, pits and craters, as well as rather complicated winding or almost liquid-like surface structures. Sputter cones were first documented in the early forties by Glinterschultze and Tollmien (1), although the structure was only inferred rather than observed. In the past 15 ye作者: 遠地點 時間: 2025-3-27 17:11 作者: 刺穿 時間: 2025-3-27 21:00 作者: ureter 時間: 2025-3-27 22:40 作者: 外來 時間: 2025-3-28 04:17 作者: Meager 時間: 2025-3-28 08:48 作者: Exposure 時間: 2025-3-28 13:49
Causes of Change in Manufactured Exports, whose characteristics are interesting for the improvement of surface properties (wear-, corrosion-, thermal oxidation resistance) (1). One of the limiting factors for such treatments is the shallow thickness of the modified layer.作者: Lucubrate 時間: 2025-3-28 18:09
Genesis and Evolution of Water Massesth process consisting of incident molecular beams provides a high degree of control over layer doping, composition, uniformity and thickness. Such control is not achievable with liquid phase epitaxy (LPE) or chemical vapor Deposition (CVD) techniques.作者: Melatonin 時間: 2025-3-28 20:02
https://doi.org/10.1007/978-94-009-4422-0ceramics; cluster; diffusion; metals; particles; segregation; semiconductor; semiconductors; thin films作者: 玉米 時間: 2025-3-29 00:55
The Metaphysics of Illness Causation,al case of this formalism. Expressions are deduced to show how both continuous surfaces and surface discontinuities evolve during growth and erosion and it is demonstrated how these can be used to advise geometrical and numerical methods of surface evolution prediction.作者: fallible 時間: 2025-3-29 06:38 作者: FLINT 時間: 2025-3-29 11:05 作者: BET 時間: 2025-3-29 13:59 作者: 腐蝕 時間: 2025-3-29 17:15
Genesis and Evolution of Water Massesth process consisting of incident molecular beams provides a high degree of control over layer doping, composition, uniformity and thickness. Such control is not achievable with liquid phase epitaxy (LPE) or chemical vapor Deposition (CVD) techniques.作者: inflate 時間: 2025-3-29 22:47 作者: galley 時間: 2025-3-30 03:03 作者: Callus 時間: 2025-3-30 07:05
Bubbles, Blisters, and Exfoliation, (see e.g. Carter et al. /1 /, G. Carter and J. Whitton, this conference). A second mechanism is due to the implantation of unsoluble gas ions, especially He, but also Ne, Ar, Kr, Xe, H, and N into the subsurface layers of a solid. It is the phenomena observed during gas ion implantation that this paper is concerned with.作者: MUTE 時間: 2025-3-30 10:42
Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface Modification, whose characteristics are interesting for the improvement of surface properties (wear-, corrosion-, thermal oxidation resistance) (1). One of the limiting factors for such treatments is the shallow thickness of the modified layer.作者: Habituate 時間: 2025-3-30 13:52 作者: GRAIN 時間: 2025-3-30 20:30
0168-132X ontributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the rang978-94-010-8468-0978-94-009-4422-0Series ISSN 0168-132X 作者: Graphite 時間: 2025-3-30 21:54 作者: 喚起 時間: 2025-3-31 04:20 作者: sundowning 時間: 2025-3-31 06:43 作者: 諷刺 時間: 2025-3-31 12:59
Erosion and Growth of Solids Stimulated by Atom and Ion Beams作者: 共棲 時間: 2025-3-31 17:09 作者: BUST 時間: 2025-3-31 19:16 作者: STALL 時間: 2025-4-1 00:23
Causation, Prediction, and Searche by iterative computation. As the number of variables which influence a parameter is reduced, or assume an invariance, so the degree of geometric analysis may be extended, but only for the simplest of cases can this analysis accurately determine the longterm evolution and tendency towards equilibri作者: 粗鄙的人 時間: 2025-4-1 05:29 作者: daredevil 時間: 2025-4-1 07:47 作者: 尋找 時間: 2025-4-1 10:46
Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altereupports the assumption that the altered layer corresponds to the range profile of the bombarding ions. Changes of the angle of i nci dence result in characteri stic transient surface concentration changes which can be explained by applying existing models for the development of the altered layer.作者: 善變 時間: 2025-4-1 16:40 作者: 配置 時間: 2025-4-1 22:24
0168-132X face features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing作者: 連詞 時間: 2025-4-1 22:38 作者: 過濾 時間: 2025-4-2 05:42
https://doi.org/10.1007/978-3-8349-3718-6ors. A list of these collaborators and the many institutes involved is given in the Acknowledgements section. However, I would like to preface this contribution by stating, clearly and unequivocally, that without the enthusiasm of, and contributions from, my collaborators, the study would have been far less effective and rewarding.作者: 仲裁者 時間: 2025-4-2 07:45
https://doi.org/10.1007/978-981-16-5268-4orr) experiments are outlined using the dark space DC bias voltage to characterize the etch. Surface analysis of etched GaAs and InP using AES, photoluminescence and EDX is used to establish the role of impurities related to changes in surface morphology and chemical changes due to RIE.
