標(biāo)題: Titlebook: Emerging Technologies for In Situ Processing; Daniel J. Ehrlich,Van Tran Nguyen (Director) Book 1988 Martinus Nijhoff Publishers, Dordretc [打印本頁(yè)] 作者: 廚房默契 時(shí)間: 2025-3-21 19:49
書(shū)目名稱Emerging Technologies for In Situ Processing影響因子(影響力)
書(shū)目名稱Emerging Technologies for In Situ Processing影響因子(影響力)學(xué)科排名
書(shū)目名稱Emerging Technologies for In Situ Processing網(wǎng)絡(luò)公開(kāi)度
書(shū)目名稱Emerging Technologies for In Situ Processing網(wǎng)絡(luò)公開(kāi)度學(xué)科排名
書(shū)目名稱Emerging Technologies for In Situ Processing被引頻次
書(shū)目名稱Emerging Technologies for In Situ Processing被引頻次學(xué)科排名
書(shū)目名稱Emerging Technologies for In Situ Processing年度引用
書(shū)目名稱Emerging Technologies for In Situ Processing年度引用學(xué)科排名
書(shū)目名稱Emerging Technologies for In Situ Processing讀者反饋
書(shū)目名稱Emerging Technologies for In Situ Processing讀者反饋學(xué)科排名
作者: declamation 時(shí)間: 2025-3-21 20:58 作者: CEDE 時(shí)間: 2025-3-22 01:52 作者: 細(xì)微的差異 時(shí)間: 2025-3-22 04:33
New World Order and Small Regions-step patterning of materials by deposition, surface modification, synthesis and etching [1,2]. The lateral dimensions of the processed regions range from several centimeters to less than one micrometer. Contrary to conventional techniques such as chemical vapor deposition (CVD), plasma deposition (作者: Arthritis 時(shí)間: 2025-3-22 11:29 作者: LEVER 時(shí)間: 2025-3-22 14:25 作者: LEVER 時(shí)間: 2025-3-22 18:33 作者: 莎草 時(shí)間: 2025-3-22 23:38
Biogeography of New Zealand Lizards,be achieved via deposition employing a tightly focused laser beam, a number of applications for laser deposition have been found in the microelectronics field. For example, highly localized deposition induced by a scanning, focused cw laser beam has been successfully used for direct writing of inter作者: Fecal-Impaction 時(shí)間: 2025-3-23 04:26 作者: appall 時(shí)間: 2025-3-23 05:31
New and Developing Sources of Food Proteins circuit manufacturing because they provide a unique combination of high precision, high volume and low cost. In these methods an opaque pattern on a trans-illuminated mask is imaged onto a photoresist—coated wafer. The intensity distribution in the image plane is imprinted on the wafer in two steps作者: obtuse 時(shí)間: 2025-3-23 10:35 作者: 弄皺 時(shí)間: 2025-3-23 14:38
New and Emerging Issues in Latinx Healthciples of this lithographic technique and experimental results obtained with a test bench Ion Projection Lithography Machine (IPLM-01) have already been presented [1-3]. This paper adresses new IPLM-01 results and a discussion of the potential of IPL techniques for in situ process ing.作者: 敲竹杠 時(shí)間: 2025-3-23 18:41 作者: 正常 時(shí)間: 2025-3-24 01:28 作者: 傲慢物 時(shí)間: 2025-3-24 02:58
Salt Present and Future Use and Production,MOCVD precursors that are available however do not absorb light strongly at wavelengths above 200nm and it is, therefore, often necessary to resort to wave lengths of less than 200nm, where most organic materials have significant absorptions. An alternative approach is to synthesize precursors conta作者: 鑲嵌細(xì)工 時(shí)間: 2025-3-24 08:43
Rosie Alexander,Tristram Hooleyt causes the gas molecules to break up and some of the gas constituents to deposit on the surface. If a focused ion beam is used, then this becomes a technique for maskless, resistless, patterned deposition. Depositions of films from gases of Al(CH.)., WF. and Ta(OC.H.). have been reported. The film作者: 內(nèi)行 時(shí)間: 2025-3-24 12:03 作者: nonplus 時(shí)間: 2025-3-24 15:30 作者: Protein 時(shí)間: 2025-3-24 20:43 作者: Cholecystokinin 時(shí)間: 2025-3-25 03:11
Ion Projection Lithography,ciples of this lithographic technique and experimental results obtained with a test bench Ion Projection Lithography Machine (IPLM-01) have already been presented [1-3]. This paper adresses new IPLM-01 results and a discussion of the potential of IPL techniques for in situ process ing.作者: Exclaim 時(shí)間: 2025-3-25 06:29
Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks,arrangement is shown in Fig. 1. The X-ray radiation is provided by BESSY, the .erlin .lectron .torage ring for .nchrotron radiation. Synchrotron radiation is nearly parallel and is emitted by a well-defined electron beam. A proximity gap between mask and wafer protects the mask against mechanical damage.作者: 怎樣才咆哮 時(shí)間: 2025-3-25 07:39 作者: ellagic-acid 時(shí)間: 2025-3-25 13:24 作者: 符合你規(guī)定 時(shí)間: 2025-3-25 16:09
0168-132X Overview: 978-94-010-7130-7978-94-009-1409-4Series ISSN 0168-132X 作者: parallelism 時(shí)間: 2025-3-25 21:42
NATO Science Series E:http://image.papertrans.cn/e/image/308423.jpg作者: foliage 時(shí)間: 2025-3-26 02:37
Kulturwandel hin zum New Work Konzept,Silicon transistors have evolved into integrating circuits starting from discrete devices over twenty years ago. The similar evolution will occur in compound semiconductor optoelectronic devices, like lasers or photodetectors. The same benefits, high performance and low cost will be also expected by such integration of optoelectronic devices.作者: lipids 時(shí)間: 2025-3-26 06:07
https://doi.org/10.1007/978-3-642-96008-6Connecting both sides of a silicon substrate has direct applications in the fabrication of multilevel packaging, interconnection networks and many microelectronic components and devices.作者: NAVEN 時(shí)間: 2025-3-26 11:12
Siqi Ding,Xinyue Wang,Baoguo HanWe use a novel technique to amplify small increases in the oxidation rate of laser irradiated silicon to successfully isolate a photonic contribution to the reaction induced by cw argon laser radiation. This method presents clear evidence of optical enhancement over the usual thermally induced growth rate.作者: 邊緣帶來(lái)墨水 時(shí)間: 2025-3-26 13:33 作者: Macronutrients 時(shí)間: 2025-3-26 19:44 作者: 磨碎 時(shí)間: 2025-3-26 21:53
Confirmation of the Wavelength Dependence of Silicon Oxidation Induced by Visible Radiation,We use a novel technique to amplify small increases in the oxidation rate of laser irradiated silicon to successfully isolate a photonic contribution to the reaction induced by cw argon laser radiation. This method presents clear evidence of optical enhancement over the usual thermally induced growth rate.作者: 你不公正 時(shí)間: 2025-3-27 03:22 作者: WATER 時(shí)間: 2025-3-27 09:07
https://doi.org/10.1007/978-3-030-80027-7metal deposition for the direct writing of these tracks have been developed [1,2] and are gaining in importance, it may well be convenient and cost effective, where larger areas of metal are involved, to employ traditional surface metalisation techniques and to effect patterning by laser micro machining.作者: 吸引人的花招 時(shí)間: 2025-3-27 09:42
Macroeconomic Policy since 1984,growth of a polycrystalline growth. Then, we will demonstrate that the use of ion implantation can lead to selective monocrystalline and polycrystalline growth of III-V compounds and a semi-insulating electrical isolation between conducting areas.作者: 積習(xí)難改 時(shí)間: 2025-3-27 17:33 作者: Devastate 時(shí)間: 2025-3-27 20:55
Biogeography of New Zealand Lizards,riting of waveguides (6), and localized deposition for repair of clear defects in lithographic masks (7–9). A mask repair system based on laser deposition of a metal repair patch is now commercially available (10)作者: Fulsome 時(shí)間: 2025-3-27 22:53 作者: 演繹 時(shí)間: 2025-3-28 04:56 作者: floaters 時(shí)間: 2025-3-28 07:23
Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition Of trical conductivity and surface adherence. The low power photolysis takes place mainly in the layers of organometallic molecules adsorbed on the surface, whereas at higher powers photolytic LCVD is a predominantly gas phase process.作者: 手勢(shì) 時(shí)間: 2025-3-28 10:50 作者: 媽媽不開(kāi)心 時(shí)間: 2025-3-28 17:58
Laser Etching and Microelectronic Applications,in conventional lithography, the processes are relatively well understood, widely practiced, and many tools are commercially available. Some laser etching techniques require further process development and only a few industrial grade tools are commercially available at this time.作者: 藕床生厭倦 時(shí)間: 2025-3-28 19:01 作者: 歌唱隊(duì) 時(shí)間: 2025-3-28 23:36 作者: 紅潤(rùn) 時(shí)間: 2025-3-29 06:17 作者: 小步舞 時(shí)間: 2025-3-29 08:41
Excimer Laser Patterning And Etching Of Metals,metal deposition for the direct writing of these tracks have been developed [1,2] and are gaining in importance, it may well be convenient and cost effective, where larger areas of metal are involved, to employ traditional surface metalisation techniques and to effect patterning by laser micro machining.作者: 上釉彩 時(shí)間: 2025-3-29 12:07
Gestaltung und Design hybrider Teams,y, stringent requirements have been placed on layer thickness, layer composition and electrical, optical and mechanical properties. At present the only viable means for producing such layers is molecular beam epitaxy (MBE).作者: arterioles 時(shí)間: 2025-3-29 19:11
New Work: Auf dem Weg zur neuen Arbeitsweltin conventional lithography, the processes are relatively well understood, widely practiced, and many tools are commercially available. Some laser etching techniques require further process development and only a few industrial grade tools are commercially available at this time.作者: 教義 時(shí)間: 2025-3-29 22:45
New and Developing Sources of Food Proteins: photoinduced modification of the resist, followed by development. Conventionally, the photon sources in projection systems have been mercury lamps, operating at 436 nm, and more recently at 405 nm and 365 nm (the G, H, and I lines, respectively, in the emission spectrum of Hg atoms) [1].作者: Substitution 時(shí)間: 2025-3-30 02:17
https://doi.org/10.1007/978-1-4615-0296-8t induced decomposition mostly starts at 0.6 melting point (K). The usefulness of various inorganic systems, as resists, for x-ray masks, for local indiffusion sources and for metal inter-connects is noted作者: Modicum 時(shí)間: 2025-3-30 07:43 作者: 小臼 時(shí)間: 2025-3-30 11:16 作者: Orgasm 時(shí)間: 2025-3-30 14:49 作者: 極大痛苦 時(shí)間: 2025-3-30 20:00 作者: Preserve 時(shí)間: 2025-3-30 22:40
Focused Ion Beam Induced Deposition,2.5μΩcm.) Deposition yields (atoms deposited per incident ion) of 4 to 100 have been observed. But the higher yields correlate with higher resistivity and higher impurity content. Preliminary transmission electron microscope examination shows the gold films to start out as unconnected islands of 40 作者: Antagonist 時(shí)間: 2025-3-31 03:17
Harlem Street Speakers in the 1930s,ure 1, we note that the most recent data shows a leveling off of the rate of change of either reduction in device dimension or reduction in cost per bit. This levelling off reflects changes in and current constraints to device and processing technology, and suggests re-evaluation of “traditional” ma作者: Dorsal 時(shí)間: 2025-3-31 06:34 作者: BRIBE 時(shí)間: 2025-3-31 11:17 作者: hieroglyphic 時(shí)間: 2025-3-31 13:22 作者: 草本植物 時(shí)間: 2025-3-31 19:31
Rosie Alexander,Tristram Hooley2.5μΩcm.) Deposition yields (atoms deposited per incident ion) of 4 to 100 have been observed. But the higher yields correlate with higher resistivity and higher impurity content. Preliminary transmission electron microscope examination shows the gold films to start out as unconnected islands of 40 作者: 起草 時(shí)間: 2025-4-1 01:14 作者: 卡死偷電 時(shí)間: 2025-4-1 01:53 作者: Foregery 時(shí)間: 2025-4-1 08:33
Laser-Induced Chemical Processing of Materials,-step patterning of materials by deposition, surface modification, synthesis and etching [1,2]. The lateral dimensions of the processed regions range from several centimeters to less than one micrometer. Contrary to conventional techniques such as chemical vapor deposition (CVD), plasma deposition (作者: 壓倒 時(shí)間: 2025-4-1 12:56 作者: Medicaid 時(shí)間: 2025-4-1 14:53 作者: ARY 時(shí)間: 2025-4-1 21:54
Epitaxial Growth of III-V Materials on Implanted III-V Substrates,d electro-optical devices. We present results on the epitaxial growth of III-V compounds, molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MO - CVD), on III-V substrates previously implanted either on the whole surface or on selected areas. More especially, the following comb
