標(biāo)題: Titlebook: Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams; Efim Oks,Ian Brown Book 2002 Kluwer Academic Publishers 2002 [打印本頁] 作者: charter 時間: 2025-3-21 18:26
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams影響因子(影響力)
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams影響因子(影響力)學(xué)科排名
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams網(wǎng)絡(luò)公開度
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams網(wǎng)絡(luò)公開度學(xué)科排名
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams被引頻次
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams被引頻次學(xué)科排名
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams年度引用
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams年度引用學(xué)科排名
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams讀者反饋
書目名稱Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams讀者反饋學(xué)科排名
作者: 館長 時間: 2025-3-21 22:07 作者: excursion 時間: 2025-3-22 03:23 作者: 密碼 時間: 2025-3-22 07:48
Vacuum Arc Deposited DLC Based Coatings, formation of nanocrystals is possible and the properties of the coatings change drastically. All these approaches were investigated on films prepared by cathodic arc and a synthesis of the results is presented here.作者: Schlemms-Canal 時間: 2025-3-22 10:59 作者: 兵團(tuán) 時間: 2025-3-22 13:02 作者: 兵團(tuán) 時間: 2025-3-22 18:09
https://doi.org/10.1007/978-1-84800-382-8tion dissipated in the plasma moves away with the expanding plasma. A possible response of the discharge is to self-adjust the total burning voltage. Through this path, the cohesive energy would affect plasma parameters via the causal chain: cohesive energy — burning voltage — power dissipation — el作者: 禁止 時間: 2025-3-22 23:06 作者: 輕快走過 時間: 2025-3-23 03:39
https://doi.org/10.1007/978-3-662-50440-6hodic arc plasma deposition system designed to deposit a variety of multilayered thin film materials with various interface morphologies. We discuss also methods of producing multilayered materials in single source continuous arc systems.作者: 官僚統(tǒng)治 時間: 2025-3-23 08:47 作者: 彩色 時間: 2025-3-23 10:46
1568-2609 arc science, and in general foster development of the field. The Workshop was a great success, as was clearly felt by all of the attendees. The small number of978-1-4020-1066-8978-94-010-0277-6Series ISSN 1568-2609 作者: spondylosis 時間: 2025-3-23 17:51 作者: FLAX 時間: 2025-3-23 21:55
High Current Electron Sources and Accelerators with Plasma Emitters,mission current from amperes to kiloamperes as well as beam current densities up to 100 A/cm2, accelerating voltage from several keV to hundred keV and pulse length from 0.1 μs to 100 μs, repetition rate up to hundred kHz.作者: 潛移默化 時間: 2025-3-24 00:06 作者: 誘導(dǎo) 時間: 2025-3-24 03:40 作者: Palpable 時間: 2025-3-24 08:47 作者: 減震 時間: 2025-3-24 11:43
Implantation of Steel from MEVVA Ion Source with Bronze Cathode,e samples were analyzed by RBS technique using 1.4 MeV He ions. The results show that the retained vs. implanted dose dependence saturates at implanted doses of the order of 1017 cm?2, due to the sputtering effects. The maximum retained doses obtained for Cu and Sn amount to 5.4×1016cm?2 and 1.2 ×1015cm?2, respectively.作者: 戰(zhàn)勝 時間: 2025-3-24 17:30 作者: galley 時間: 2025-3-24 19:14 作者: SMART 時間: 2025-3-25 00:57
Physical Basis of Plasma Parameters Control in a Vacuum Arc, measurements of plasma parameters at moderate arc currents. The models discussed and developed, are used to interpret experimental data on the vacuum arc plasma. Interpretation of a few effects observed is given and prediction of arc plasma behaviour is made.作者: 停止償付 時間: 2025-3-25 04:03 作者: 死亡 時間: 2025-3-25 08:05 作者: 人充滿活力 時間: 2025-3-25 15:38 作者: 慢跑鞋 時間: 2025-3-25 15:48 作者: otic-capsule 時間: 2025-3-25 22:20
Multibody Mechanics and Visualizatione samples were analyzed by RBS technique using 1.4 MeV He ions. The results show that the retained vs. implanted dose dependence saturates at implanted doses of the order of 1017 cm?2, due to the sputtering effects. The maximum retained doses obtained for Cu and Sn amount to 5.4×1016cm?2 and 1.2 ×1015cm?2, respectively.作者: 無力更進(jìn) 時間: 2025-3-26 02:14
https://doi.org/10.1007/1-4020-2982-9a distance of 40 cm from the discharge gap. Comparison is performed of these data with, the corresponding values for metal ions obtained from a laser produced plasma and it is shown that the vacuum discharge plasma as a source of the multiply charged metal ions is rather more effective than the laser one.作者: aerobic 時間: 2025-3-26 05:03 作者: Keratectomy 時間: 2025-3-26 10:22 作者: 難解 時間: 2025-3-26 14:55
https://doi.org/10.1007/978-3-7091-1289-2temperature oxidation resistance of the TiN coating by implanting Si ions alone. Thermogravimetry measurements show that 1×1017 cm?2 Si ions implanted from modified MEVVA-type ion source operated at 75 kV results in more than twofold reduction of the oxidation rate at 630?.作者: 慢慢流出 時間: 2025-3-26 17:48
Sources of Multiply Charged Metal Ions: Vacuum Discharge or Laser Produced Plasma?,a distance of 40 cm from the discharge gap. Comparison is performed of these data with, the corresponding values for metal ions obtained from a laser produced plasma and it is shown that the vacuum discharge plasma as a source of the multiply charged metal ions is rather more effective than the laser one.作者: BATE 時間: 2025-3-27 00:49
Emission Methods of Experimental Investigations of Ion Velocities in Vacuum Arc Plasmas,l velocities of the ions do not depend on the ion charge state. Comparison of the data obtained with calculated values allows the conclusion that the acceleration of ions in a vacuum arc occurs by the magnetohydrodynamic mechanism.作者: 在駕駛 時間: 2025-3-27 04:09 作者: 葡萄糖 時間: 2025-3-27 08:37
Resistance to High Temperature Oxidation in Si-Implanted TiN Coatings on Steel,temperature oxidation resistance of the TiN coating by implanting Si ions alone. Thermogravimetry measurements show that 1×1017 cm?2 Si ions implanted from modified MEVVA-type ion source operated at 75 kV results in more than twofold reduction of the oxidation rate at 630?.作者: Pantry 時間: 2025-3-27 11:52
https://doi.org/10.1007/978-3-540-49546-8f the extraction system and replaced its tungsten copper alloy by molybdenum. A new glue technique for the trigger ring has improved the trigger reliability. Some results of the 300 hours uranium beam time in December 2001 at the UNILAC will be presented. We will give an overview about the beam transport along the low energy beam.作者: Eeg332 時間: 2025-3-27 17:04 作者: 浮雕 時間: 2025-3-27 18:23 作者: 窩轉(zhuǎn)脊椎動物 時間: 2025-3-27 23:03 作者: coalition 時間: 2025-3-28 04:47 作者: 自愛 時間: 2025-3-28 09:05
Emerging Applications of Vacuum-Arc-Produced Plasma, Ion and Electron Beams978-94-010-0277-6Series ISSN 1568-2609 作者: AXIS 時間: 2025-3-28 11:37
https://doi.org/10.1007/978-1-84800-382-8e burning voltage depends approximately linearly on the cohesive energy. For-Berkeley’s vacuum arc ion source system it was quantified as ..+AE., with .. ≈ 14.3V and . = 1.69 V/(eV/atom). Two arguments are brought forward to identify physical justifications for the empirical rule. First, the self-ad作者: Conserve 時間: 2025-3-28 15:27
https://doi.org/10.1007/978-3-319-91204-2ose agreement with measurements at low currents but check of the theory of magnetically confined expansion is incomplete due to the absence of regular measurements of plasma parameters at moderate arc currents. The models discussed and developed, are used to interpret experimental data on the vacuum作者: Intend 時間: 2025-3-28 20:35
https://doi.org/10.1007/1-4020-2982-9nt types. The main attention is paid to the works, which have been performed the recent two years by the team headed by the author. It is shown that plasma jet of a moderate voltage (< 2.5 kV) vacuum spark generates short- run beams of the cathode matter ions (Cun+, Tan+) with the charge states up t作者: Jogging 時間: 2025-3-29 00:37 作者: anesthesia 時間: 2025-3-29 05:54
https://doi.org/10.1007/978-3-662-05069-9ps have two different methods of measuring the ion charge state distributions. The results can be considered as a proof of the E-MEVVA principle. These results sparked discussions regarding which physics effects are dominant. Basic physics seems straightforward, an ion charge state in E-MEVVA is det作者: adduction 時間: 2025-3-29 08:51
https://doi.org/10.1007/978-3-540-49546-8ood reproducibility and high availability. An overview of the MEVVA ion source with the most important operational data and technical details for uranium operation will be given. Further improvements of the source have been carried out: Meshes of stainless steel are used in the plasma drift section 作者: Individual 時間: 2025-3-29 12:21
https://doi.org/10.1007/978-1-84996-320-6the extraction system, the energy of the electrons inside the plasma, the charge state distribution of the extracted beam, and the initial energy of the ions, geometry, and applied potentials. The effect of partial space charge compensation will be discussed.作者: 偽造 時間: 2025-3-29 18:26
Multiaccess, Mobility and Teletrafficons of each type in a beam. The design and parameters of the sources are presented. The mass- charge state of ion beams is studied, and the dependence of the gas ion fraction in a beam on the length of a discharge gap is analyzed. Also presented in the paper is a new version of the design of the TIT作者: CLOT 時間: 2025-3-29 23:22
https://doi.org/10.1007/978-1-4757-5918-1cent years are discussed. The attractiveness of this kind e-gun is due to its capability of creating high current, broad or focused beams, both in pulsed, burst and steady state modes of operation. The mesh plasma cathode in combination with a vacuum arc used for formation of a electron beams with e作者: 生銹 時間: 2025-3-30 01:27 作者: narcissism 時間: 2025-3-30 04:48
https://doi.org/10.1007/978-1-4757-5920-4that the discharge of this type can be used for efficient generation of dense and uniform gaseous plasma. Special features of the electron emitter design allowed to reach long lifetime due to reduction the arc cathode erosion rate as well as to avoid contamination of the gas plasma by metal species.作者: myelography 時間: 2025-3-30 10:00 作者: bronchodilator 時間: 2025-3-30 12:37 作者: 向外 時間: 2025-3-30 17:16 作者: 價值在貶值 時間: 2025-3-30 22:59 作者: 旁觀者 時間: 2025-3-31 04:10
https://doi.org/10.1007/978-3-662-50440-6als are required. The properties of the structures diverge considerably from those of the bulk constituents and thus are likely to depend on the interfaces present. Interfaces in such structures can be smooth, graded or rough. To determine to what extent the interface quality determines the properti作者: 裝勇敢地做 時間: 2025-3-31 05:14 作者: 尊重 時間: 2025-3-31 09:21
https://doi.org/10.1007/978-3-7091-1289-2by high-temperature corrosion (oxidation). Recently it has been shown that Ti-Si-B-N coatings prepared by reactive sputtering from multi-element Ti-Si-B targets exhibit excellent resistance to high-temperature corrosion, and that such resistance can also be obtained by ion implantation of Si and B i作者: cochlea 時間: 2025-3-31 13:25
https://doi.org/10.1007/978-3-662-67262-4ical inertness, and very low friction coefficients of these coatings. Vacuum arc deposition is well suited to prepare superhard films with high sp3/sp2 ratios. However, the high level of internal stresses originating during growth prevents the deposition of thick films, and their hardness makes it d作者: Presbycusis 時間: 2025-3-31 18:43
https://doi.org/10.1007/978-94-010-0277-6Plasma; electron; heavy ion; ion; metals; plasma physics作者: 嚴(yán)厲批評 時間: 2025-3-31 23:14
NATO Science Series II: Mathematics, Physics and Chemistryhttp://image.papertrans.cn/e/image/308195.jpg作者: carotenoids 時間: 2025-4-1 02:28 作者: 鞭打 時間: 2025-4-1 06:52
https://doi.org/10.1007/978-1-84996-320-6the extraction system, the energy of the electrons inside the plasma, the charge state distribution of the extracted beam, and the initial energy of the ions, geometry, and applied potentials. The effect of partial space charge compensation will be discussed.作者: 接合 時間: 2025-4-1 13:40 作者: insomnia 時間: 2025-4-1 17:22
Status of MEVVA Experiments in ITEP,and MEWA-M (MEWA with two anodes) ion sources are presented. As well, the common MEWA is used as injector for RFQ linac providing experiments with plasma target. The results of copper ion beam acceleration are presented.作者: Obverse 時間: 2025-4-1 20:17
