標(biāo)題: Titlebook: Chemical Vapour Deposition of Diamond for Dental Tools and Burs; Waqar Ahmed,Htet Sein,St. John Crean Book 2014 The Editor(s) (if applicab [打印本頁] 作者: LH941 時(shí)間: 2025-3-21 19:54
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書目名稱Chemical Vapour Deposition of Diamond for Dental Tools and Burs影響因子(影響力)學(xué)科排名
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書目名稱Chemical Vapour Deposition of Diamond for Dental Tools and Burs網(wǎng)絡(luò)公開度學(xué)科排名
書目名稱Chemical Vapour Deposition of Diamond for Dental Tools and Burs被引頻次
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書目名稱Chemical Vapour Deposition of Diamond for Dental Tools and Burs讀者反饋
書目名稱Chemical Vapour Deposition of Diamond for Dental Tools and Burs讀者反饋學(xué)科排名
作者: RLS898 時(shí)間: 2025-3-21 20:31 作者: Ccu106 時(shí)間: 2025-3-22 02:42
https://doi.org/10.1007/978-90-481-2431-2 as substrate temperature, substrate bias, pressure, methane concentration, plasma characteristics and affinity of the substrate for diamond nucleation. In this chapter the effects of process parameters on the structure and morphology of the films deposited and therefore control of the film properties.作者: 賭博 時(shí)間: 2025-3-22 06:41 作者: 全面 時(shí)間: 2025-3-22 09:54 作者: mutineer 時(shí)間: 2025-3-22 15:30 作者: mutineer 時(shí)間: 2025-3-22 17:46 作者: Disk199 時(shí)間: 2025-3-22 23:56
2192-1091 nd surgical tools. It examines various deposition techniques, discusses mechanisms of diamond growth and their impact on cutting tool life and?performance.978-3-319-00647-5978-3-319-00648-2Series ISSN 2192-1091 Series E-ISSN 2192-1105 作者: 自然環(huán)境 時(shí)間: 2025-3-23 05:07 作者: 原諒 時(shí)間: 2025-3-23 07:17 作者: NAG 時(shí)間: 2025-3-23 10:53
Chemical Vapour Deposition of Diamond for Dental Tools and Burs978-3-319-00648-2Series ISSN 2192-1091 Series E-ISSN 2192-1105 作者: 有雜色 時(shí)間: 2025-3-23 16:33 作者: PURG 時(shí)間: 2025-3-23 20:31 作者: aviator 時(shí)間: 2025-3-23 23:07
SpringerBriefs in Materialshttp://image.papertrans.cn/c/image/224466.jpg作者: 不妥協(xié) 時(shí)間: 2025-3-24 03:01
Book 2014This volume presents chemical vapour deposition of diamond films for application in cutting tools, microdrills, dental burs and surgical tools. It examines various deposition techniques, discusses mechanisms of diamond growth and their impact on cutting tool life and?performance.作者: 對手 時(shí)間: 2025-3-24 08:28 作者: 解脫 時(shí)間: 2025-3-24 13:05
978-3-319-00647-5The Editor(s) (if applicable) and The Author(s), under exclusive license to Springer Nature Switzerl作者: Obvious 時(shí)間: 2025-3-24 15:45
Dental Tools, Human Tooth and Environment,e bur focusing on design and the effect of different rake angles on cutting, then the chapter focuses on the design and construction of elements of the hand piece itself.? The finals aspect explains the direction of research that needs to be taken in order to develop a hand piece that has been optimized for use with different dental materials.作者: faculty 時(shí)間: 2025-3-24 20:37 作者: agnostic 時(shí)間: 2025-3-24 23:11
Progress in Radiopharmacology 1985e bur focusing on design and the effect of different rake angles on cutting, then the chapter focuses on the design and construction of elements of the hand piece itself.? The finals aspect explains the direction of research that needs to be taken in order to develop a hand piece that has been optim作者: 急性 時(shí)間: 2025-3-25 06:18
Epidemiology and Etiology of Glioma,bility and uniformity are key requirements. Diamond deposited onto silicon substrates has been widely researched using both microwave and hot filament chemical vapour deposition (CVD). In this chapter hot-filament CVD has been employed to deposit diamond onto flat substrates to prove that the proces作者: nutrients 時(shí)間: 2025-3-25 08:18
https://doi.org/10.1007/978-1-4684-2916-9emical vapour deposition (HFCVD). In this chapter the deposition of diamond onto wires and microdrills using a new VFCVD system has been described. In this arrangement the wire and drills were held concentrically within the core of the filament where maximum plasma intensity is prevalent. The struct作者: 空洞 時(shí)間: 2025-3-25 13:44
https://doi.org/10.1007/978-90-481-2431-2sion onto the substrate material. These film characteristics are in turn controlled by a number of factors including the VFCVD reactor parameters such as substrate temperature, substrate bias, pressure, methane concentration, plasma characteristics and affinity of the substrate for diamond nucleatio作者: Obverse 時(shí)間: 2025-3-25 15:58 作者: minaret 時(shí)間: 2025-3-25 23:48
https://doi.org/10.1007/978-981-33-4392-4The deposition of diamond films using VFCVD onto tungsten carbide dental burs has been described. To enhance nucleation, growth and adhesion of diamond substrate was pre-treated using a Murakami etch. The structure and morphology of the diamond coated burs and uncoated burs have been compared.作者: hegemony 時(shí)間: 2025-3-26 01:22 作者: 啤酒 時(shí)間: 2025-3-26 06:08
Growth and Application of Diamond Thin Films,The chapter describes the growth and application of thin films.? The development of the hot filament CVD process is described in terms of surface pre-treatments and CVD equipment preparation.? The chapter then focuses on how metal cutting theory can be applied to the machining of bone which is an essential procedure in dental practice.作者: LEER 時(shí)間: 2025-3-26 09:21
Diamond Deposition on Tungsten Carbide Burs Using VFCVD,The deposition of diamond films using VFCVD onto tungsten carbide dental burs has been described. To enhance nucleation, growth and adhesion of diamond substrate was pre-treated using a Murakami etch. The structure and morphology of the diamond coated burs and uncoated burs have been compared.作者: 失敗主義者 時(shí)間: 2025-3-26 12:39 作者: 漫不經(jīng)心 時(shí)間: 2025-3-26 19:11 作者: Atheroma 時(shí)間: 2025-3-27 00:18 作者: Small-Intestine 時(shí)間: 2025-3-27 01:19
Diamond Deposition onto Flat Substrates,bility and uniformity are key requirements. Diamond deposited onto silicon substrates has been widely researched using both microwave and hot filament chemical vapour deposition (CVD). In this chapter hot-filament CVD has been employed to deposit diamond onto flat substrates to prove that the proces作者: Measured 時(shí)間: 2025-3-27 07:18 作者: 阻撓 時(shí)間: 2025-3-27 12:23
Controlling Structure and Morphology,sion onto the substrate material. These film characteristics are in turn controlled by a number of factors including the VFCVD reactor parameters such as substrate temperature, substrate bias, pressure, methane concentration, plasma characteristics and affinity of the substrate for diamond nucleatio作者: nauseate 時(shí)間: 2025-3-27 14:04 作者: Phenothiazines 時(shí)間: 2025-3-27 18:13
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