標(biāo)題: Titlebook: Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies; Yves Pauleau Book 2002 Kluwer Academic Publishers 200 [打印本頁] 作者: Wilder 時間: 2025-3-21 19:01
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書目名稱Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies影響因子(影響力)學(xué)科排名
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書目名稱Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies網(wǎng)絡(luò)公開度學(xué)科排名
書目名稱Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies被引頻次
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書目名稱Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies讀者反饋
書目名稱Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies讀者反饋學(xué)科排名
作者: Discrete 時間: 2025-3-21 21:43
1568-2609 es. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films.作者: 潰爛 時間: 2025-3-22 02:28
https://doi.org/10.1007/978-1-349-08114-1ds, the use of the sol-gel processing offers advantages by sufficiently inexpensive film technologies. Additionally, purity and stability of the precursors, homogeneity of mixed precursors, comparably low processing temperatures to transfer gel films into pure inorganic films can be used to generate high-performance thin films.作者: 持久 時間: 2025-3-22 05:47
O. B. Alankus,R. D. Hibberd,C. B. Besant-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capability of conformal deposition on highly irregularly shaped surfaces. CVD processes have been reviewed in e.g. refs. [.]-[.].作者: Debility 時間: 2025-3-22 10:49
Meta-learning Improves Emotion Recognitionposition of thin films, exposure or removal of photo-resists, and recrystallization of silicon on insulator substrates [.–.]. The desirability of using a focused laser beam for maskless fabrication and alteration of integrated circuits has also been recognized [.].作者: 古董 時間: 2025-3-22 12:55 作者: 古董 時間: 2025-3-22 18:28 作者: correspondent 時間: 2025-3-23 00:33
Sol-Gel Deposition Processes of Thin Ceramic Films,ds, the use of the sol-gel processing offers advantages by sufficiently inexpensive film technologies. Additionally, purity and stability of the precursors, homogeneity of mixed precursors, comparably low processing temperatures to transfer gel films into pure inorganic films can be used to generate high-performance thin films.作者: bile648 時間: 2025-3-23 02:44
Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes,-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capability of conformal deposition on highly irregularly shaped surfaces. CVD processes have been reviewed in e.g. refs. [.]-[.].作者: 圍巾 時間: 2025-3-23 07:19 作者: 歡呼 時間: 2025-3-23 10:49 作者: THROB 時間: 2025-3-23 17:54
Deposition of Thin Films by Sputtering,ey have their specific advantages and simultaneously introduce given limitations. Below, selected PVD techniques will be classified and described in details. Special emphasis will be given to the group of sputtering techniques whereas high vacuum evaporation and its modifications go beyond the frame of this paper.作者: visual-cortex 時間: 2025-3-23 20:08 作者: cauda-equina 時間: 2025-3-24 01:08 作者: 分發(fā) 時間: 2025-3-24 03:25 作者: inflame 時間: 2025-3-24 08:59 作者: 束以馬具 時間: 2025-3-24 14:01
Book 2002nderstanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes...A handbook for engineers and scientists and an introduction for students of microelectronics. .作者: 負(fù)擔(dān) 時間: 2025-3-24 15:09 作者: SENT 時間: 2025-3-24 21:42
https://doi.org/10.1007/978-1-4020-9056-1nt mechanisms that will be explored in these lectures. The practical realisation of photo-assisted CVD can be complex but improved light sources and reactor designs now offers a wider choice in achieving a practical system. The choice of light sources, precursors and reaction chambers will be covered in some depth.作者: Perennial長期的 時間: 2025-3-24 23:53 作者: JIBE 時間: 2025-3-25 07:20 作者: Assault 時間: 2025-3-25 11:12 作者: 矛盾 時間: 2025-3-25 11:55
978-1-4020-0525-1Kluwer Academic Publishers 2002作者: Offset 時間: 2025-3-25 17:24 作者: 懸掛 時間: 2025-3-25 21:51
https://doi.org/10.1007/978-1-4020-9056-1Chemical Vapor Deposition (CVD) of oxides is a very large branch in the field of CVD processes and is always a large part in books about CVD [.].作者: 惡心 時間: 2025-3-26 03:31 作者: Erythropoietin 時間: 2025-3-26 07:34
Chemical Vapor Deposition of Superconductor and Oxide Films,Chemical Vapor Deposition (CVD) of oxides is a very large branch in the field of CVD processes and is always a large part in books about CVD [.].作者: 并入 時間: 2025-3-26 10:17
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies978-94-010-0353-7Series ISSN 1568-2609 作者: lactic 時間: 2025-3-26 15:59
Unfinished Study of Cold Forming Systems example, smaller entities (i.e., organometallic molecules) are preferably used under their gas form; larger ones (particles) require using other approaches, including Langmuir-Blodgett technique, layer-by- layer assembly or electrodeposition. When preformed nanosized objects are used to fabricate m作者: HACK 時間: 2025-3-26 17:50
J. Atkinson,G. Barrow,R. G. Hannamc quality of wafers which are cut from bulk crystals is not good enough for making active devices directly on wafers, to grow same materials as substrates but better quality on wafers (.). Epitaxial growth can be also applied for making stacked multi-layer structures of several layers for such as in作者: FUME 時間: 2025-3-26 21:49
https://doi.org/10.1007/978-1-349-08114-1de range of film compositions can be manufactured by gas phase or liquid phase deposition methods. Due to the high apparative costs of gas phase methods, the use of the sol-gel processing offers advantages by sufficiently inexpensive film technologies. Additionally, purity and stability of the precu作者: 癡呆 時間: 2025-3-27 03:55
The CAD of Feed Drive Control SystemsSol-Gel techniques [.–.]. The success of chemical synthesis routes is largely attributed to the availability of molecular compounds that can be transformed via solution (Sol-Gel) [.–.] or gas phase (CVD) [.,.] reactions into high-purity coatings of desired ceramics or composites. In contrast to the 作者: PAC 時間: 2025-3-27 06:54
O. B. Alankus,R. D. Hibberd,C. B. Besantn wafers in the IC-industry, decorative coatings, anti-reflection and spectrally selective coatings on optical components, and anti-corrosion and anti-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capab作者: hieroglyphic 時間: 2025-3-27 11:19
https://doi.org/10.1007/978-1-4020-9056-1k and a full sequence of lithography, etching, resist removal and cleaning. In Selective Chemical Vapor Deposition (CVD) the selectivity is obtained by the different chemical behavior of reactants with different surfaces. The advantage of selective CVD is the self-alignment with respect to the previ作者: delta-waves 時間: 2025-3-27 15:28
https://doi.org/10.1007/978-1-4020-9056-1ng about some beneficial change in the deposition process. This can entail an enhancement in deposition rate or an improvement in film quality such as density, composition or reduced defect concentration. The range of materials covered in these lectures will include oxides, semiconductors and metals作者: enterprise 時間: 2025-3-27 21:20
Meta-learning Improves Emotion Recognitiononic materials and devices for various applications such as wafer marking, substrate surface cleaning, doping and oxidation of silicon, etching and deposition of thin films, exposure or removal of photo-resists, and recrystallization of silicon on insulator substrates [.–.]. The desirability of usin作者: Ptsd429 時間: 2025-3-28 01:36 作者: 代理人 時間: 2025-3-28 05:12 作者: 不利 時間: 2025-3-28 09:19
Jets and Jet Substructure—A Mini Reviewhe last one encompasses sputtering and evaporation. They are applied, dependent on particular requirements of the production technology. Obviously, they have their specific advantages and simultaneously introduce given limitations. Below, selected PVD techniques will be classified and described in d作者: 高調(diào) 時間: 2025-3-28 13:39
https://doi.org/10.1007/978-981-19-2354-8f properties the nitriding of an austenitic AISI 304 stainless steel is widely studied. It is shown that ion nitriding provided by ion beam/plasma techniques at elevated temperature (～400°C) is a potential candidate to overcome the problem of enhancing surface hardness and wear resistance of an aust作者: relieve 時間: 2025-3-28 16:12 作者: Pessary 時間: 2025-3-28 20:09
Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials,c quality of wafers which are cut from bulk crystals is not good enough for making active devices directly on wafers, to grow same materials as substrates but better quality on wafers (.). Epitaxial growth can be also applied for making stacked multi-layer structures of several layers for such as in作者: 廢墟 時間: 2025-3-29 00:46
Sol-Gel Deposition Processes of Thin Ceramic Films,de range of film compositions can be manufactured by gas phase or liquid phase deposition methods. Due to the high apparative costs of gas phase methods, the use of the sol-gel processing offers advantages by sufficiently inexpensive film technologies. Additionally, purity and stability of the precu作者: Cryptic 時間: 2025-3-29 04:40
Thin Film Deposition By Sol-Gel and CVD Processing of Metal-Organic Precursors,Sol-Gel techniques [.–.]. The success of chemical synthesis routes is largely attributed to the availability of molecular compounds that can be transformed via solution (Sol-Gel) [.–.] or gas phase (CVD) [.,.] reactions into high-purity coatings of desired ceramics or composites. In contrast to the 作者: separate 時間: 2025-3-29 08:00
Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes,n wafers in the IC-industry, decorative coatings, anti-reflection and spectrally selective coatings on optical components, and anti-corrosion and anti-wear layers on mechanical tools. CVD is very versatile and offers good control of film structure and composition, excellent uniformity, and the capab作者: Tartar 時間: 2025-3-29 13:33 作者: decode 時間: 2025-3-29 19:08 作者: mechanism 時間: 2025-3-29 22:09
Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures,onic materials and devices for various applications such as wafer marking, substrate surface cleaning, doping and oxidation of silicon, etching and deposition of thin films, exposure or removal of photo-resists, and recrystallization of silicon on insulator substrates [.–.]. The desirability of usin
