標(biāo)題: SCIE期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS 2024/2025影響因子:7.581 (IEEE T IND ELECTRON) (0278-0046). (ENGINEERING, [打印本頁(yè)] 作者: 無(wú)法仿效 時(shí)間: 2025-3-21 18:10
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(20 21 REV HIST)影響因子
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(IEEE T IND ELECTRON)影響因子@(工程，電氣和電子)學(xué)科排名
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(20 21 REV HIST)總引論文
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(IEEE T IND ELECTRON)總引論文@(工程，電氣和電子)學(xué)科排名
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(20 21 REV HIST)影響因子
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(IEEE T IND ELECTRON)總引頻次@(工程，電氣和電子)學(xué)科排名
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(20 21 REV HIST)即時(shí)影響因子
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(IEEE T IND ELECTRON)即時(shí)影響因子@(工程，電氣和電子)學(xué)科排名
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(20 21 REV HIST)五年累積影響因子
SCIE(SCI)期刊IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS(IEEE T IND ELECTRON)五年累積影響因子@(工程，電氣和電子)學(xué)科排名
作者: 顯赫的人 時(shí)間: 2025-3-21 21:51
Submitted on: 10 April 2002.
Revised on: 20 June 2002.
Accepted on: 04 July 2002.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 無(wú)價(jià)值 時(shí)間: 2025-3-22 02:12 作者: 隨意 時(shí)間: 2025-3-22 05:13
Submitted on: 30 July 2014.
Revised on: 08 November 2014.
Accepted on: 15 December 2014.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 我吃花盤(pán)旋 時(shí)間: 2025-3-22 09:32 作者: Hypopnea 時(shí)間: 2025-3-22 15:59 作者: NADIR 時(shí)間: 2025-3-22 19:16
Submitted on: 20 September 2000.
Revised on: 26 November 2000.
Accepted on: 04 January 2001.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 薄膜 時(shí)間: 2025-3-22 21:25
Submitted on: 21 April 2018.
Revised on: 18 August 2018.
Accepted on: 30 September 2018.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: impale 時(shí)間: 2025-3-23 03:03
Submitted on: 07 November 2018.
Revised on: 05 February 2019.
Accepted on: 26 February 2019.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 一起平行 時(shí)間: 2025-3-23 06:10 作者: 運(yùn)動(dòng)吧 時(shí)間: 2025-3-23 11:31 作者: 缺陷 時(shí)間: 2025-3-23 17:08
Submitted on: 22 September 2004.
Revised on: 18 November 2004.
Accepted on: 05 December 2004.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 不來(lái) 時(shí)間: 2025-3-23 21:51
Submitted on: 25 January 2020.
Revised on: 15 February 2020.
Accepted on: 13 April 2020.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 兇猛 時(shí)間: 2025-3-24 02:06
Submitted on: 09 December 2005.
Revised on: 05 April 2006.
Accepted on: 20 May 2006.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: harangue 時(shí)間: 2025-3-24 03:26
Submitted on: 07 November 2018.
Revised on: 05 December 2018.
Accepted on: 24 January 2019.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 過(guò)分自信 時(shí)間: 2025-3-24 08:36
Submitted on: 06 October 2013.
Revised on: 08 January 2014.
Accepted on: 23 January 2014.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: pester 時(shí)間: 2025-3-24 11:40 作者: ARENA 時(shí)間: 2025-3-24 15:11 作者: 大火 時(shí)間: 2025-3-24 20:55 作者: glamor 時(shí)間: 2025-3-25 01:42
Submitted on: 18 January 2023.
Revised on: 15 April 2023.
Accepted on: 26 April 2023.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: indicate 時(shí)間: 2025-3-25 05:59
Submitted on: 08 July 2016.
Revised on: 09 August 2016.
Accepted on: 19 September 2016.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 讓你明白 時(shí)間: 2025-3-25 08:51
Submitted on: 04 December 2005.
Revised on: 27 December 2005.
Accepted on: 07 February 2006.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 騙子 時(shí)間: 2025-3-25 15:33
Submitted on: 01 July 2003.
Revised on: 19 August 2003.
Accepted on: 18 September 2003.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 線 時(shí)間: 2025-3-25 16:56
Submitted on: 11 September 2005.
Revised on: 17 November 2005.
Accepted on: 25 December 2005.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: 輕推 時(shí)間: 2025-3-25 23:19 作者: Capture 時(shí)間: 2025-3-26 01:12
Submitted on: 04 March 2008.
Revised on: 28 March 2008.
Accepted on: 14 April 2008.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: rheumatology 時(shí)間: 2025-3-26 06:21
Submitted on: 24 June 1998.
Revised on: 24 July 1998.
Accepted on: 02 September 1998.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: POWER 時(shí)間: 2025-3-26 11:45
Submitted on: 27 February 1999.
Revised on: 18 May 1999.
Accepted on: 10 June 1999.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: BAIT 時(shí)間: 2025-3-26 13:43 作者: 座右銘 時(shí)間: 2025-3-26 17:00 作者: overshadow 時(shí)間: 2025-3-26 22:44
Submitted on: 24 November 2018.
Revised on: 03 February 2019.
Accepted on: 22 March 2019.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS作者: MURAL 時(shí)間: 2025-3-27 04:52 作者: acclimate 時(shí)間: 2025-3-27 07:44 作者: 不要嚴(yán)酷 時(shí)間: 2025-3-27 09:50 作者: 鐵塔等 時(shí)間: 2025-3-27 17:10 作者: Aspiration 時(shí)間: 2025-3-27 18:17
Submitted on: 31 July 2000.
Revised on: 13 September 2000.
Accepted on: 28 September 2000.
___________________IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS
